XTROLOGY Trademark

Trademark Overview


On Thursday, April 3, 2025, a trademark application was filed for XTROLOGY with the United States Patent and Trademark Office. The USPTO has given the XTROLOGY trademark a serial number of 79425805. The federal status of this trademark filing is NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER as of Thursday, June 12, 2025. This trademark is owned by HORIBA STEC, Co., Ltd.. The XTROLOGY trademark is filed in the Computer & Software Products & Electrical & Scientific Products category with the following description:

Semiconductor wafer inspection apparatus; analyzing apparatus for defect of semiconductor wafers; analyzing apparatus for stress of semiconductor wafers; analyzing apparatus for composition of semiconductor wafers; semiconductor wafer measuring apparatus; semiconductor wafer testing apparatus; semiconductor photomask inspection apparatus; analyzing apparatus for defect of semiconductor photomasks; analyzing apparatus for stress of semiconductor photomasks; analyzing apparatus for composition of semiconductor photomasks; semiconductor photomask measuring apparatus; semiconductor photomask testing apparatus; semiconductor reticle inspection apparatus; analyzing apparatus for defect of semiconductor reticles; analyzing apparatus for stress of semiconductor reticles; analyzing apparatus for composition of semiconductor reticles; semiconductor reticle measuring apparatus; semiconductor reticle testing apparatus; semiconductor substrate inspection apparatus; analyzing apparatus for defect of...
xtrology

General Information


Serial Number79425805
Word MarkXTROLOGY
Filing DateThursday, April 3, 2025
Status630 - NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER
Status DateThursday, June 12, 2025
Registration Number0000000
Registration DateNOT AVAILABLE
Mark Drawing4 - Illustration: Drawing with word(s) / letter(s) / number(s) in Block form
Published for Opposition DateNOT AVAILABLE

Trademark Statements


Goods and ServicesSemiconductor wafer inspection apparatus; analyzing apparatus for defect of semiconductor wafers; analyzing apparatus for stress of semiconductor wafers; analyzing apparatus for composition of semiconductor wafers; semiconductor wafer measuring apparatus; semiconductor wafer testing apparatus; semiconductor photomask inspection apparatus; analyzing apparatus for defect of semiconductor photomasks; analyzing apparatus for stress of semiconductor photomasks; analyzing apparatus for composition of semiconductor photomasks; semiconductor photomask measuring apparatus; semiconductor photomask testing apparatus; semiconductor reticle inspection apparatus; analyzing apparatus for defect of semiconductor reticles; analyzing apparatus for stress of semiconductor reticles; analyzing apparatus for composition of semiconductor reticles; semiconductor reticle measuring apparatus; semiconductor reticle testing apparatus; semiconductor substrate inspection apparatus; analyzing apparatus for defect of semiconductor substrates; analyzing apparatus for stress of semiconductor substrates; analyzing apparatus for composition of semiconductor substrates; semiconductor substrate measuring apparatus; semiconductor substrate testing apparatus; sensors for mapping semiconductor wafers; Raman spectrographic measurement apparatus, and parts and accessories therefor; Raman spectroscopic analyzing apparatus, and parts and accessories therefor; measuring apparatus for measuring film thickness; measuring apparatus for spectral measurements; automated optical inspection apparatus; X-ray fluorescence measuring apparatus; measuring or testing machines and instruments, and parts and accessories therefor; photoluminescence or fluorescence microscope spectrometers, and parts and accessories therefor; photoluminescence or fluorescence microscope spectrographs, and parts and accessories therefor; optical machines and apparatus; photographic machines and apparatus; cinematographic machines and apparatus; laboratory apparatus and instruments; computer software for inspection, defect analysis, stress analysis, composition analysis, measurement and testing of semiconductor wafers, photomasks, reticles and substrates; computer software; computer programs; scanning probe microscopes; X-ray fluorescence analyzing apparatus; electronic computer and data processing machines and apparatus and their parts; power distribution or control machines and apparatus; rotary converters; phase modifiers; batteries and cells; electric or magnetic meters and testers; electric wires and cables; spectacles [eyeglasses and goggles]; life-saving apparatus and equipment; telecommunication machines and apparatus; fire alarms; gas alarms; water leak alarms; oil leak alarms; anti-theft warning apparatus.

Classification Information


International Class009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus.
US Class Codes021, 023, 026, 036, 038
Class Status Code6 - Active
Class Status DateThursday, June 12, 2025
Primary Code009
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History


Party NameHORIBA STEC, Co., Ltd.
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressJP

Trademark Events


Event DateEvent Description
Thursday, June 12, 2025SN ASSIGNED FOR SECT 66A APPL FROM IB
Friday, June 13, 2025NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Friday, June 13, 2025APPLICATION FILING RECEIPT MAILED