| Serial Number | 79103531 |
| Word Mark | WONIK IPS |
| Filing Date | Wednesday, March 16, 2011 |
| Status | 706 - SECTION 71 ACCEPTED |
| Status Date | Saturday, March 11, 2023 |
| Registration Number | 4204134 |
| Registration Date | Tuesday, September 11, 2012 |
| Mark Drawing | 3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s) |
| Published for Opposition Date | Tuesday, June 26, 2012 |
| Description of Mark | The mark consists of the stylized wording "WONIK" in blue, the stylized letters "IPS" in red, and a gray circular design inside the character "O". |
| Certificate of Correction for Registration | In the statement, Page 1, line 8, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 8, through line 11, "ATOMIC LAYER DEPOSITION APPARATUS, ION BEAM DEPOSITION APPARATUS, ION BEAM ETCHING APPARATUS, ANNEALING APPARATUS, RAPID THERMAL PROCESSING APPARATUS, COUPLED SPUTTERING APPARATUS," should be deleted. In the statement, Page 1, line 11, through line 17, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 14, through line 15, "ION BEAM ETCHING APPARATUS," should be deleted. In the statement, Page 1, line 17, "ELECTRON BEAM ANNEALING APPARATUS," should be deleted. |
| Goods and Services | Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, ] low temperature annealing apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, coupled sputtering apparatus, ] multiple sputtering apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * laser sublimation deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * organic molecular chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam generation apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam sputter deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, ion beam etching apparatus, ] ion beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam crystallization apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, electron beam annealing apparatus, ] oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [ ; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electrocutions display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; micro electromechanical systems (ME MS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix light emitting diode (GAMBOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ] |
| Goods and Services | Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor Keita apparatus, liquid Keita apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors [ ; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and GAMBOLED displays ] |
| Indication of Colors claimed | The color(s) blue, red and gray is/are claimed as a feature of the mark. |
| Translation of Words in Mark | The wording "WONIK" has no meaning in a foreign language. |
| International Class | 007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs. |
| US Class Codes | 013, 019, 021, 023, 031, 034, 035 |
| Class Status Code | 6 - Active |
| Class Status Date | Friday, October 28, 2011 |
| Primary Code | 007 |
| First Use Anywhere Date | NOT AVAILABLE |
| First Use In Commerce Date | NOT AVAILABLE |
| International Class | 037 - Building construction; repair; installation services. |
| US Class Codes | 100, 103, 106 |
| Class Status Code | 6 - Active |
| Class Status Date | Friday, October 28, 2011 |
| Primary Code | 037 |
| First Use Anywhere Date | NOT AVAILABLE |
| First Use In Commerce Date | NOT AVAILABLE |
| Party Name | WONIK CORPORATION |
| Party Type | 32 - New Owner After Registration |
| Legal Entity Type | 99 - Other |
| Address | KR |
| Party Name | WONIK IPS CO., LTD |
| Party Type | 31 - New Owner After Registration |
| Legal Entity Type | 99 - Other |
| Address | KR |
| Party Name | WONIK IPS CO., LTD |
| Party Type | 30 - Original Registrant |
| Legal Entity Type | 99 - Other |
| Address | KR |
| Party Name | WONIK IPS CO., LTD |
| Party Type | 20 - Owner at Publication |
| Legal Entity Type | 99 - Other |
| Address | KR |
| Party Name | WONIK IPS CO., LTD |
| Party Type | 10 - Original Applicant |
| Legal Entity Type | 99 - Other |
| Address | KR |
| Event Date | Event Description |
| Monday, December 18, 2023 | PARTIAL INVALIDATION PROCESSED BY THE IB |
| Thursday, November 16, 2023 | PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
| Thursday, November 16, 2023 | INVALIDATION PROCESSED |
| Saturday, November 11, 2023 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| Saturday, March 11, 2023 | NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED |
| Saturday, March 11, 2023 | REGISTERED-SEC.71 ACCEPTED |
| Saturday, March 11, 2023 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| Friday, October 7, 2022 | CHANGE OF OWNER RECEIVED FROM IB |
| Thursday, September 8, 2022 | TEAS SECTION 71 RECEIVED |
| Saturday, September 11, 2021 | COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED |
| Friday, April 30, 2021 | INTERNATIONAL REGISTRATION RENEWED |
| Tuesday, December 17, 2019 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
| Wednesday, November 27, 2019 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| Friday, May 3, 2019 | PARTIAL INVALIDATION PROCESSED BY THE IB |
| Wednesday, March 27, 2019 | PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
| Wednesday, March 27, 2019 | INVALIDATION PROCESSED |
| Friday, February 22, 2019 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| Friday, June 22, 2018 | NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED |
| Friday, June 22, 2018 | REGISTERED-SEC.71 ACCEPTED |
| Friday, May 11, 2018 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| Monday, April 30, 2018 | TEAS SECTION 71 RECEIVED |
| Thursday, November 16, 2017 | LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| Monday, October 23, 2017 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| Monday, October 23, 2017 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| Monday, October 16, 2017 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| Friday, October 13, 2017 | CORRECTION TRANSACTION RECEIVED FROM IB |
| Friday, October 13, 2017 | CORRECTION TRANSACTION RECEIVED FROM IB |
| Friday, October 13, 2017 | CORRECTION TRANSACTION RECEIVED FROM IB |
| Friday, October 13, 2017 | LIMITATION OF GOODS RECEIVED FROM IB |
| Monday, September 11, 2017 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED |
| Thursday, July 21, 2016 | CHANGE OF OWNER RECEIVED FROM IB |
| Tuesday, July 5, 2016 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
| Tuesday, July 5, 2016 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| Friday, November 6, 2015 | LIMITATION FROM THE IB EXAMINED AND ENTERED |
| Thursday, November 5, 2015 | CORRECTION UNDER SECTION 7 ¿ PROCESSED |
| Thursday, November 5, 2015 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| Friday, July 31, 2015 | LIMITATION OF GOODS RECEIVED FROM IB |
| Monday, January 7, 2013 | FINAL DECISION TRANSACTION PROCESSED BY IB |
| Monday, December 17, 2012 | FINAL DISPOSITION NOTICE SENT TO IB |
| Monday, December 17, 2012 | FINAL DISPOSITION PROCESSED |
| Tuesday, December 11, 2012 | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB |
| Monday, December 10, 2012 | NOTIFICATION PROCESSED BY IB |
| Tuesday, September 11, 2012 | REGISTERED-PRINCIPAL REGISTER |
| Tuesday, June 26, 2012 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| Tuesday, June 26, 2012 | PUBLISHED FOR OPPOSITION |
| Wednesday, June 6, 2012 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
| Wednesday, June 6, 2012 | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB |
| Wednesday, June 6, 2012 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
| Monday, May 21, 2012 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
| Monday, May 14, 2012 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| Thursday, April 19, 2012 | TEAS/EMAIL CORRESPONDENCE ENTERED |
| Thursday, April 19, 2012 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
| Friday, April 13, 2012 | ASSIGNED TO LIE |
| Tuesday, April 3, 2012 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
| Tuesday, April 3, 2012 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
| Friday, December 30, 2011 | CHANGE OF NAME/ADDRESS REC'D FROM IB |
| Monday, December 19, 2011 | REFUSAL PROCESSED BY IB |
| Tuesday, November 15, 2011 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
| Tuesday, November 15, 2011 | REFUSAL PROCESSED BY MPU |
| Tuesday, November 15, 2011 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| Monday, November 14, 2011 | NON-FINAL ACTION WRITTEN |
| Monday, November 14, 2011 | FAX RECEIVED |
| Tuesday, November 8, 2011 | NON-FINAL ACTION (IB REFUSAL) WITHDRAWN FOR REVIEW |
| Saturday, November 5, 2011 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| Friday, November 4, 2011 | NON-FINAL ACTION WRITTEN |
| Tuesday, November 1, 2011 | APPLICATION FILING RECEIPT MAILED |
| Friday, October 28, 2011 | ASSIGNED TO EXAMINER |
| Friday, October 28, 2011 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED |
| Thursday, October 27, 2011 | SN ASSIGNED FOR SECT 66A APPL FROM IB |