Serial Number | 79102249 |
Word Mark | WONIK IPS |
Filing Date | Wednesday, March 16, 2011 |
Status | 404 - IR CANCELLED - US REGISTRATION CANCELLED |
Status Date | Wednesday, March 17, 2021 |
Registration Number | 4204098 |
Registration Date | Tuesday, September 11, 2012 |
Mark Drawing | 3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s) |
Published for Opposition Date | Tuesday, June 26, 2012 |
Indication of Colors claimed | The color(s) blue, red, gray and white is/are claimed as a feature of the mark. |
Description of Mark | The mark consists of the wording "WONIK IPS" and a circular blue, gray and white design feature to the left of the wording. The wording "WONIK" is in blue, with a circular gray and white design within the letter "O", and the wording "IPS" is in red. |
Goods and Services | Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ] |
Goods and Services | Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ] |
Translation of Words in Mark | The wording "WONIK" has no meaning in a foreign language. |
International Class | 007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs. |
US Class Codes | 013, 019, 021, 023, 031, 034, 035 |
Class Status Code | F - NOT AVAILABLE |
Class Status Date | Sunday, August 18, 2019 |
Primary Code | 007 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 037 - Building construction; repair; installation services. |
US Class Codes | 100, 103, 106 |
Class Status Code | F - NOT AVAILABLE |
Class Status Date | Sunday, August 18, 2019 |
Primary Code | 037 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
Party Name | WONIK IPS CO., LTD |
Party Type | 31 - New Owner After Registration |
Legal Entity Type | 03 - Corporation |
Address | KR |
Party Name | WONIK IPS CO., LTD |
Party Type | 30 - Original Registrant |
Legal Entity Type | 99 - Other |
Address | KR |
Party Name | WONIK IPS CO., LTD |
Party Type | 20 - Owner at Publication |
Legal Entity Type | 99 - Other |
Address | KR |
Party Name | WONIK IPS CO., LTD |
Party Type | 10 - Original Applicant |
Legal Entity Type | 99 - Other |
Address | KR |
Event Date | Event Description |
Sunday, October 3, 2021 | NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED |
Sunday, October 3, 2021 | DEATH OF INTERNATIONAL REGISTRATION |
Friday, July 3, 2020 | TOTAL INVALIDATION PROCESSED BY THE IB |
Thursday, June 4, 2020 | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
Thursday, June 4, 2020 | INVALIDATION PROCESSED |
Saturday, April 18, 2020 | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED |
Tuesday, August 20, 2019 | NOTICE OF CANCELLATION SEC. 71 E-MAILED |
Sunday, August 18, 2019 | CANCELLED SECTION 71 |
Tuesday, April 16, 2019 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
Sunday, March 31, 2019 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
Monday, February 11, 2019 | POST REGISTRATION ACTION MAILED - SEC.71 |
Thursday, February 7, 2019 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
Thursday, January 31, 2019 | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED |
Thursday, January 31, 2019 | TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED |
Tuesday, July 31, 2018 | POST REGISTRATION ACTION MAILED - SEC.71 |
Tuesday, May 8, 2018 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
Friday, April 27, 2018 | TEAS SECTION 71 RECEIVED |
Monday, October 16, 2017 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
Friday, October 13, 2017 | CORRECTION TRANSACTION RECEIVED FROM IB |
Monday, September 11, 2017 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED |
Thursday, July 21, 2016 | CHANGE OF OWNER RECEIVED FROM IB |
Monday, August 17, 2015 | LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
Friday, July 31, 2015 | LIMITATION OF GOODS RECEIVED FROM IB |
Monday, May 6, 2013 | FINAL DECISION TRANSACTION PROCESSED BY IB |
Tuesday, April 16, 2013 | FINAL DISPOSITION NOTICE SENT TO IB |
Tuesday, April 16, 2013 | FINAL DISPOSITION PROCESSED |
Tuesday, December 11, 2012 | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB |
Sunday, December 2, 2012 | NOTIFICATION PROCESSED BY IB |
Tuesday, September 11, 2012 | REGISTERED-PRINCIPAL REGISTER |
Tuesday, June 26, 2012 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
Tuesday, June 26, 2012 | PUBLISHED FOR OPPOSITION |
Wednesday, June 6, 2012 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
Wednesday, June 6, 2012 | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB |
Wednesday, June 6, 2012 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
Monday, May 21, 2012 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
Friday, May 11, 2012 | APPROVED FOR PUB - PRINCIPAL REGISTER |
Friday, May 11, 2012 | EXAMINER'S AMENDMENT ENTERED |
Friday, May 11, 2012 | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED |
Friday, May 11, 2012 | EXAMINERS AMENDMENT E-MAILED |
Friday, May 11, 2012 | EXAMINERS AMENDMENT -WRITTEN |
Thursday, April 19, 2012 | TEAS/EMAIL CORRESPONDENCE ENTERED |
Thursday, April 19, 2012 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Friday, April 6, 2012 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
Friday, April 6, 2012 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
Friday, December 30, 2011 | CHANGE OF NAME/ADDRESS REC'D FROM IB |
Sunday, October 30, 2011 | REFUSAL PROCESSED BY IB |
Wednesday, October 19, 2011 | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED |
Thursday, October 13, 2011 | ASSIGNED TO LIE |
Wednesday, October 12, 2011 | FAX RECEIVED |
Tuesday, October 11, 2011 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
Tuesday, October 11, 2011 | REFUSAL PROCESSED BY MPU |
Monday, October 10, 2011 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
Sunday, October 9, 2011 | NON-FINAL ACTION WRITTEN |
Tuesday, October 4, 2011 | APPLICATION FILING RECEIPT MAILED |
Friday, September 30, 2011 | ASSIGNED TO EXAMINER |
Friday, September 30, 2011 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM |
Thursday, September 29, 2011 | SN ASSIGNED FOR SECT 66A APPL FROM IB |