WONIK IPS Trademark

Trademark Overview


On Wednesday, March 16, 2011, a trademark application was filed for WONIK IPS with the United States Patent and Trademark Office. The USPTO has given the WONIK IPS trademark a serial number of 79102249. The federal status of this trademark filing is IR CANCELLED - US REGISTRATION CANCELLED as of Wednesday, March 17, 2021. This trademark is owned by WONIK IPS CO., LTD. The WONIK IPS trademark is filed in the Machinery Products and Construction & Repair Services categories with the following description:

Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and...

Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installati...
wonik ips

General Information


Serial Number79102249
Word MarkWONIK IPS
Filing DateWednesday, March 16, 2011
Status404 - IR CANCELLED - US REGISTRATION CANCELLED
Status DateWednesday, March 17, 2021
Registration Number4204098
Registration DateTuesday, September 11, 2012
Mark Drawing3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s)
Published for Opposition DateTuesday, June 26, 2012

Trademark Statements


Indication of Colors claimedThe color(s) blue, red, gray and white is/are claimed as a feature of the mark.
Description of MarkThe mark consists of the wording "WONIK IPS" and a circular blue, gray and white design feature to the left of the wording. The wording "WONIK" is in blue, with a circular gray and white design within the letter "O", and the wording "IPS" is in red.
Goods and ServicesSemiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, low temperature annealing apparatus, coupled sputtering apparatus, multiple sputtering apparatus, laser sublimation deposition apparatus, organic molecular chemical vapor deposition apparatus, ion beam generation apparatus, ion beam sputter deposition apparatus, ion beam etching apparatus, ion beam assisted deposition apparatus, electron beam assisted deposition apparatus, electron beam crystallization apparatus, electron beam annealing apparatus, oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electroluminescence display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; microelectromechanical systems (MEMS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix organic light emitting diode (AMOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]
Goods and ServicesInstallation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus [, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor epitaxy apparatus, liquid epitaxy apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, ashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, ashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and AMOLED displays ]
Translation of Words in MarkThe wording "WONIK" has no meaning in a foreign language.

Classification Information


International Class007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
US Class Codes013, 019, 021, 023, 031, 034, 035
Class Status CodeF - NOT AVAILABLE
Class Status DateSunday, August 18, 2019
Primary Code007
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

International Class037 - Building construction; repair; installation services.
US Class Codes100, 103, 106
Class Status CodeF - NOT AVAILABLE
Class Status DateSunday, August 18, 2019
Primary Code037
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History


Party NameWONIK IPS CO., LTD
Party Type31 - New Owner After Registration
Legal Entity Type03 - Corporation
AddressKR

Party NameWONIK IPS CO., LTD
Party Type30 - Original Registrant
Legal Entity Type99 - Other
AddressKR

Party NameWONIK IPS CO., LTD
Party Type20 - Owner at Publication
Legal Entity Type99 - Other
AddressKR

Party NameWONIK IPS CO., LTD
Party Type10 - Original Applicant
Legal Entity Type99 - Other
AddressKR

Trademark Events


Event DateEvent Description
Sunday, October 3, 2021NOTIFICATION OF EFFECT OF CANCELLATION OF INTL REG E-MAILED
Sunday, October 3, 2021DEATH OF INTERNATIONAL REGISTRATION
Friday, July 3, 2020TOTAL INVALIDATION PROCESSED BY THE IB
Thursday, June 4, 2020TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
Thursday, June 4, 2020INVALIDATION PROCESSED
Saturday, April 18, 2020TOTAL INVALIDATION OF REG EXT PROTECTION CREATED
Tuesday, August 20, 2019NOTICE OF CANCELLATION SEC. 71 E-MAILED
Sunday, August 18, 2019CANCELLED SECTION 71
Tuesday, April 16, 2019INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE
Sunday, March 31, 2019PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED
Monday, February 11, 2019POST REGISTRATION ACTION MAILED - SEC.71
Thursday, February 7, 2019CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Thursday, January 31, 2019TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Thursday, January 31, 2019TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Tuesday, July 31, 2018POST REGISTRATION ACTION MAILED - SEC.71
Tuesday, May 8, 2018CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Friday, April 27, 2018TEAS SECTION 71 RECEIVED
Monday, October 16, 2017CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Friday, October 13, 2017CORRECTION TRANSACTION RECEIVED FROM IB
Monday, September 11, 2017COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED
Thursday, July 21, 2016CHANGE OF OWNER RECEIVED FROM IB
Monday, August 17, 2015LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED
Friday, July 31, 2015LIMITATION OF GOODS RECEIVED FROM IB
Monday, May 6, 2013FINAL DECISION TRANSACTION PROCESSED BY IB
Tuesday, April 16, 2013FINAL DISPOSITION NOTICE SENT TO IB
Tuesday, April 16, 2013FINAL DISPOSITION PROCESSED
Tuesday, December 11, 2012FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Sunday, December 2, 2012NOTIFICATION PROCESSED BY IB
Tuesday, September 11, 2012REGISTERED-PRINCIPAL REGISTER
Tuesday, June 26, 2012OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Tuesday, June 26, 2012PUBLISHED FOR OPPOSITION
Wednesday, June 6, 2012NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Wednesday, June 6, 2012NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Wednesday, June 6, 2012NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Monday, May 21, 2012LAW OFFICE PUBLICATION REVIEW COMPLETED
Friday, May 11, 2012APPROVED FOR PUB - PRINCIPAL REGISTER
Friday, May 11, 2012EXAMINER'S AMENDMENT ENTERED
Friday, May 11, 2012NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
Friday, May 11, 2012EXAMINERS AMENDMENT E-MAILED
Friday, May 11, 2012EXAMINERS AMENDMENT -WRITTEN
Thursday, April 19, 2012TEAS/EMAIL CORRESPONDENCE ENTERED
Thursday, April 19, 2012CORRESPONDENCE RECEIVED IN LAW OFFICE
Friday, April 6, 2012TEAS CHANGE OF CORRESPONDENCE RECEIVED
Friday, April 6, 2012TEAS RESPONSE TO OFFICE ACTION RECEIVED
Friday, December 30, 2011CHANGE OF NAME/ADDRESS REC'D FROM IB
Sunday, October 30, 2011REFUSAL PROCESSED BY IB
Wednesday, October 19, 2011APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Thursday, October 13, 2011ASSIGNED TO LIE
Wednesday, October 12, 2011FAX RECEIVED
Tuesday, October 11, 2011NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Tuesday, October 11, 2011REFUSAL PROCESSED BY MPU
Monday, October 10, 2011NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Sunday, October 9, 2011NON-FINAL ACTION WRITTEN
Tuesday, October 4, 2011APPLICATION FILING RECEIPT MAILED
Friday, September 30, 2011ASSIGNED TO EXAMINER
Friday, September 30, 2011NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM
Thursday, September 29, 2011SN ASSIGNED FOR SECT 66A APPL FROM IB