ULGLAZE Trademark

Trademark Overview

On Monday, May 30, 2011, a trademark application was filed for ULGLAZE with the United States Patent and Trademark Office. The USPTO has given the ULGLAZE trademark a serial number of 79098688. The federal status of this trademark filing is SECTION 71 ACCEPTED as of Monday, April 11, 2022. This trademark is owned by ULVAC, INC.. The ULGLAZE trademark is filed in the Machinery Products category with the following description:

Chemical vapor deposition apparatus for use in the manufacture of semiconductors; vacuum deposition apparatus for use in the manufacture of semiconductors; sputtering apparatus for use in the manufacture of semiconductors
ulglaze

General Information

Serial Number79098688
Word MarkULGLAZE
Filing DateMonday, May 30, 2011
Status706 - SECTION 71 ACCEPTED
Status DateMonday, April 11, 2022
Registration Number4081965
Registration DateTuesday, January 10, 2012
Mark Drawing4000 - Illustration: Drawing with word(s) / letter(s) / number(s) in Block form
Published for Opposition DateTuesday, October 25, 2011

Trademark Statements

Goods and ServicesChemical vapor deposition apparatus for use in the manufacture of semiconductors; vacuum deposition apparatus for use in the manufacture of semiconductors; sputtering apparatus for use in the manufacture of semiconductors
Pseudo MarkUL GLAZE

Classification Information

International Class007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
US Class Codes013, 019, 021, 023, 031, 034, 035
Class Status Code6 - Active
Class Status DateFriday, July 15, 2011
Primary Code007
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History

Party NameULVAC, INC.
Party Type30 - Original Registrant
Legal Entity Type03 - Corporation
AddressChigasaki-shi Kanagawa 253-8543
JP
Party NameULVAC, INC.
Party Type20 - Owner at Publication
Legal Entity Type03 - Corporation
AddressJP
Party NameULVAC, INC.
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressJP

Trademark Events

Event DateEvent Description
Saturday, September 30, 2023NEW REPRESENTATIVE AT IB RECEIVED
Monday, April 11, 2022NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED
Monday, April 11, 2022REGISTERED-SEC.71 ACCEPTED
Wednesday, February 9, 2022CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Monday, July 19, 2021TEAS SECTION 71 RECEIVED
Thursday, June 17, 2021INTERNATIONAL REGISTRATION RENEWED
Sunday, January 10, 2021COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED
Friday, April 20, 2018NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - E-MAILED
Friday, April 20, 2018REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
Wednesday, April 18, 2018TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Tuesday, December 5, 2017POST REGISTRATION ACTION MAILED - SEC. 71 & 15
Wednesday, October 18, 2017CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Tuesday, September 19, 2017TEAS SECTION 71 & 15 RECEIVED
Friday, September 21, 2012NOTIFICATION PROCESSED BY IB
Monday, May 7, 2012FINAL DISPOSITION NOTICE SENT TO IB
Monday, May 7, 2012FINAL DISPOSITION PROCESSED
Sunday, February 12, 2012NOTIFICATION PROCESSED BY IB
Thursday, February 9, 2012GRANT OF PROTECTION CREATED, TO BE SENT TO IB
Tuesday, January 10, 2012REGISTERED-PRINCIPAL REGISTER
Tuesday, October 25, 2011PUBLISHED FOR OPPOSITION
Friday, October 14, 2011UNDELIVERABLE MAIL - NO ACTION TAKEN
Wednesday, October 5, 2011NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Wednesday, October 5, 2011NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Wednesday, October 5, 2011NOTICE OF PUBLICATION
Tuesday, September 20, 2011APPROVED FOR PUB - PRINCIPAL REGISTER
Thursday, September 15, 2011ASSIGNED TO EXAMINER
Tuesday, July 19, 2011APPLICATION FILING RECEIPT MAILED
Friday, July 15, 2011NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Friday, July 8, 2011SN ASSIGNED FOR SECT 66A APPL FROM IB

Related Keywords

ulglaze semiconductors manufacture apparatus deposition sputtering vacuum vapor chemical