Trademark Overview
On Tuesday, March 26, 2024, a trademark application was filed for NANOFRAZOR with the United States Patent and Trademark Office. The USPTO has given the NANOFRAZOR trademark a serial number of 79397459. The federal status of this trademark filing is NON-FINAL ACTION COUNTED - NOT MAILED as of Tuesday, October 8, 2024. This trademark is owned by Heidelberg Instruments Mikrotechnik GmbH. The NANOFRAZOR trademark is filed in the Machinery Products and Computer & Software Products & Electrical & Scientific Products categories with the following description:
Apparatus and instruments for scientific research in laboratories; scientific apparatus and instruments for microelectronics, microsystems technology, semiconductor and nanotechnology; measuring devices, electrical, photographic, optical, measuring, signaling and monitoring devices, in particular for precision systems in microelectronics, microsystems technology, semiconductor and nanotechnology; peripheral devices for computers; data processing units, data processing devices and computers; recorded and downloadable media; computer software; electrical systems for remote-controlled industrial operations; electrical systems [control systems] for production plants in microelectronics, microsystems technology, semiconductor and nanotechnology; measuring instruments; measuring devices; material testing instruments and machines; apparatus and instruments for physics; precision measuring apparatus; projectors; probes for scientific purposes; tips, probes, needles, cantilevers and transducers...
Machines and machine tools for microelectronics, microsystems technology, semiconductor and nanotechnology; machines for the production of electronic components and optical and technical devices; precision machines and spare parts for these machines; lithography systems, consisting of lithography machines, lithography devices and lithography components; nanolithography systems, consisting of nanolithography machines, nanolithography devices and nanolithography components; thermal scanning probe lithography systems, consisting of thermal scanning probe lithography machines, thermal scanning probe lithography devices and thermal scanning probe lithography components; lithography systems for direct structuring of substrates, consisting of lithography machines, lithography devices and lithography components; grayscale lithography systems, consisting of grayscale lithography machines, grayscale lithography devices and grayscale lithography components.
