Trademark Overview
On Tuesday, March 26, 2024, a trademark application was filed for NANOFRAZOR with the United States Patent and Trademark Office. The USPTO has given the NANOFRAZOR trademark a serial number of 79397459. The federal status of this trademark filing is NEW APPLICATION - RECORD INITIALIZED NOT ASSIGNED TO EXAMINER as of Thursday, June 13, 2024. This trademark is owned by Heidelberg Instruments Mikrotechnik GmbH. The NANOFRAZOR trademark is filed in the Machinery Products and Computer & Software Products & Electrical & Scientific Products categories with the following description:
Apparatus and instruments for scientific research in laboratories; scientific apparatus and instruments for microelectronics, microsystems technology, semiconductor and nanotechnology; measuring devices, electrical, photographic, optical, measuring, signaling and monitoring devices, in particular for precision systems in microelectronics, microsystems technology, semiconductor and nanotechnology; peripheral devices for computers; data processing units, data processing devices and computers; recorded and downloadable media; computer software; electrical systems for remote-controlled industrial operations; electrical systems [control systems] for production plants in microelectronics, microsystems technology, semiconductor and nanotechnology; measuring instruments; measuring devices; material testing instruments and machines; apparatus and instruments for physics; precision measuring apparatus; projectors; probes for scientific purposes; tips, probes, needles, cantilevers and transducers...
Machines and machine tools for microelectronics, microsystems technology, semiconductor and nanotechnology; machines for the production of electronic components and optical and technical devices; precision machines and spare parts for these machines; lithography systems, consisting of lithography machines, lithography devices and lithography components; nanolithography systems, consisting of nanolithography machines, nanolithography devices and nanolithography components; thermal scanning probe lithography systems, consisting of thermal scanning probe lithography machines, thermal scanning probe lithography devices and thermal scanning probe lithography components; lithography systems for direct structuring of substrates, consisting of lithography machines, lithography devices and lithography components; grayscale lithography systems, consisting of grayscale lithography machines, grayscale lithography devices and grayscale lithography components.
