Serial Number | 87187723 |
Word Mark | YOUTEC SUPPORT AND SERVICE |
Filing Date | Thursday, September 29, 2016 |
Status | 606 - ABANDONED - NO STATEMENT OF USE FILED |
Status Date | Monday, January 14, 2019 |
Registration Number | 0000000 |
Registration Date | NOT AVAILABLE |
Mark Drawing | 3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s) |
Published for Opposition Date | Tuesday, April 17, 2018 |
Indication of Colors claimed | The color(s) blue is/are claimed as a feature of the mark. |
Disclaimer with Predetermined Text | "SUPPORT AND SERVICE" |
Description of Mark | The mark consists of the word "YOUTEC" in blue font above a blue horizontal line. Below the horizontal line and in smaller, blue font are the words "SUPPORT" and "SERVICE". |
Goods and Services | (Based on Sections 1(b) and 44(e)): Conductive resin material, namely, unprocessed synthetic resins for use as an electrical conductor in the manufacture of semiconductors |
Goods and Services | (Based on Section 1(b) only): Electronic components, namely, semiconductor wafers for use in the manufacture of semiconductors; Semiconductor manufacturing apparatus and systems, namely, semiconductor substrates and semiconductor wafers and parts thereof; Chemical processing machines, namely, separating machines, dissolving machines, extracting machines and parts thereof; Metalworking machines, namely, boring machines, bending machines, cutting machines and parts thereof; Plastic processing machines and parts thereof; Chemical processing machines for industrial use and parts thereof; Apparatus for forming thin film coatings for use in the manufacture of semiconductors and for processing metal surfaces and insulating materials, and parts thereof; Apparatus for depositing thin film coatings on metal surfaces by chemical vapor deposition processing and parts thereof; Apparatus for forming thin films for use in the manufacture of semiconductors using a chemical vapor deposition process, and parts thereof; Apparatus for forming thin films on plastic surfaces through a chemical vapor deposition process, and parts thereof; Apparatus for forming thin films on glass surfaces by a chemical vapor deposition process, and parts thereof; Industrial apparatus for processing ion plating applications of metal surfaces and parts thereof; Industrial apparatus for processing ion plating applications for use in semiconductor manufacturing and parts thereof; Industrial apparatus for processing ion plating applications for plastic surfaces, and parts thereof; Industrial apparatus for processing ion plating applications for glass surfaces, and parts thereof; Sputtering apparatus for metal surface processing and parts thereof, for industrial use; Sputtering apparatus for semiconductor manufacturing and parts thereof; Sputtering apparatus for plastic surface processing and parts thereof, for industrial use; Sputtering apparatus for glass surface processing and parts thereof, for industrial use; Etching apparatus for metal surface processing and parts thereof, for industrial use; Etching apparatus for semiconductor manufacturing and parts thereof; Etching apparatus for plastic surface processing and parts thereof, for industrial use; Etching apparatus for glass surface processing and parts thereof, for industrial use; Vacuum evaporation apparatus for surface treatment of semiconductors and parts thereof; Vacuum evaporation processing apparatus for treatment of metal surfaces of semiconductor components, and parts thereof; Vacuum evaporation apparatus for semiconductor manufacturing and parts thereof; Vacuum evaporation apparatus for plastic surface processing of semiconductor components, and parts thereof; Vacuum evaporation processing apparatus for use on glass surfaces of semiconductor components, and parts thereof; Cleaning machines comprising a spray nozzle connected to a liquid carbon dioxide tank which utilizes carbon dioxide particles to clean substrates such as semiconductor or glass substrates by blowing dust particles of the substrate surface, organic matter of the substrate surface or burrs which occur during micro-process on the substrate surface while scanning the carbon dioxide particles from the spray nozzle to the substrate; Cleaning machines comprising a spray nozzle connected to a liquid carbon dioxide tank which utilizes carbon dioxide particles to clean products such as electronic or semiconductor products by blowing dust particles of the product surface, organic matter of the product surface or burrs which occur during micro-process on the product surface while scanning the carbon dioxide particles from the spray nozzle to the product |
Goods and Services | (Based on Sections 1(b) and 44(e)): Electronic components, namely, piezoelectric switches and digital transmitters; Integrated electronic circuits and parts thereof; Power line electrical communication systems for transferring broadband data over electrical power lines comprised of computer hardware, software and modems; Electronic machines for identifying surface thickness of thin film applications to semiconductor components and applying film applications to semiconductor components; Conductive material, namely, semiconductor wafers, light conducting filaments, insulated copper wire; Ionic solutions for providing conductivity for use in semiconductor manufacturing; Conductive material sprays incorporating ionic solutions for use in semiconductor manufacturing; Conductive paste incorporating ionic solutions for use in semiconductor manufacturing |
Goods and Services | (Based on Sections 1(b) and 44(e)): Household containers for food; Dishware or dinnerware |
Goods and Services | (Based on Sections 1(b) and 44(e)): Repair and maintenance of machines for use in the manufacture of electronic semiconductor components; Repair and maintenance of semiconductor manufacturing machines; Repair and maintenance of chemical processing machines; Repair and maintenance of metalworking machines; Repair and maintenance of plastic processing machines; Repair and maintenance of industrial machines used to process physical properties of matter and energy, as well as chemical properties; Repair and maintenance of machines for depositing thin films of synthetic polymers on semiconductors, metal surfaces and electrical insulating materials; Repair and maintenance of apparatus for forming thin films by chemical vapor deposition process for metal surface; Repair and maintenance of apparatus for forming thin films by chemical vapor deposition for semiconductor manufacturing; Repair and maintenance of apparatus for forming thin films by chemical vapor deposition process for plastic surface; Repair and maintenance of apparatus for forming thin films by chemical vapor deposition process for glass surface; Repair and maintenance of ion plating apparatus for metal surface processing of semiconductor components; Repair and maintenance of ion plating apparatus for semiconductor manufacturing; Repair and maintenance of ion plating apparatus for plastic surface processing of semiconductor components; Repair and maintenance of ion plating apparatus for glass surface processing of semiconductor components; Repair and maintenance of sputtering apparatus for metal surface processing of semiconductor components; Repair and maintenance of sputtering apparatus for semiconductor manufacturing; Repair and maintenance of sputtering apparatus for plastic surface processing of semiconductor components; Repair and maintenance of sputtering apparatus for glass surface processing of semiconductor components; Repair and maintenance of etching apparatus for metal surface processing; Repair and maintenance of etching apparatus for semiconductor manufacturing; Repair and maintenance of etching apparatus for plastic surface processing; Repair and maintenance of etching apparatus for glass surface processing; Repair and maintenance of vacuum evaporation apparatus for use in semiconductor manufacturing; Repair and maintenance of vacuum evaporation apparatus for metal surface preprocess in semiconductor manufacturing; Repair and maintenance of vacuum evaporation apparatus for plastic surface processing of semiconductor components; Repair and maintenance of vacuum evaporation apparatus for glass surface processing of semiconductor components |
Goods and Services | (Based on Sections 1(b) and 44(e)): Process coating of semiconductor components for others using thin film synthetic polymers (Based on Section 1(b) only): Processing and assembling of electronic components for the semiconductor manufacturing industry; Processing and assembly of electronic circuits and parts thereof for others; Processing and assembly of electrical communication components for the semiconductor manufacturing industry; Processing and assembly of electronic machines for use in the semiconductor manufacturing industry; Custom manufacture of machines for manufacturing electronic semiconductor components; Custom manufacture of semiconductor manufacturing machines and parts thereof; Custom manufacture of chemical processing machines and parts thereof; Custom manufacture of metalworking machines and parts thereof; Custom manufacture of plastic processing machines and parts thereof; Custom manufacture of industrial machines used to process physical properties of matter and energy, as well as chemical properties and parts thereof; Custom manufacture of apparatus for depositing thin film synthetic polymers on semiconductors, metal surfaces and electrical insulating materials; Custom manufacture of apparatus for depositing thin film synthetic polymers by chemical vapor deposition for metal surface processing, and parts thereof; Custom manufacture of apparatus for depositing thin film synthetic polymers by chemical vapor deposition for semiconductor manufacturing and parts thereof; Custom manufacture of apparatus for depositing thin film synthetic polymers by chemical vapor deposition for plastic surface processing, and parts thereof; Custom manufacture of apparatus for depositing thin film synthetic polymers by chemical vapor deposition for glass surface processing, and parts thereof; Custom manufacture of ion plating apparatus for metal surface processing and parts thereof; Custom manufacture of ion plating apparatus for semiconductor manufacturing and parts thereof; Custom manufacture of ion plating apparatus for plastic surface processing and parts thereof; Custom manufacture of ion plating apparatus for glass surface processing and parts thereof; Custom manufacture of sputtering apparatus for metal surface processing and parts thereof; Custom manufacture of sputtering apparatus for semiconductor manufacturing and parts thereof; Custom manufacture of sputtering apparatus for plastic surface processing and parts thereof; Custom manufacture of sputtering apparatus for glass surface processing and parts thereof; Custom manufacture of etching apparatus for metal surface processing and parts thereof; Custom manufacture of etching apparatus for semiconductor manufacturing and parts thereof; Custom manufacture of etching apparatus for plastic surface processing and parts thereof; Custom manufacture of etching apparatus for glass surface processing and parts thereof; Custom manufacture of vacuum evaporation apparatus for industrial surface processing and parts thereof; Custom manufacture of vacuum evaporation apparatus for metal surface processing and parts thereof; Custom manufacture of vacuum evaporation apparatus for semiconductor manufacturing and parts thereof; Custom manufacture of vacuum evaporation apparatus for plastic surface processing and parts thereof; Custom manufacture of vacuum evaporation apparatus for glass surface processing and parts thereof; Custom manufacture of cleaning apparatus comprising a spray nozzle connected to a liquid carbon dioxide tank, and replacement parts therefore |
Goods and Services | (Based on Sections 1(b) and 44(e): Advisory and consultancy services relating to the design of electronic components manufacturing machines for use in the semiconductor industry; Advisory and consultancy services relating to the design of semiconductor manufacturing machines and systems; Advisory and consultancy services relating to the design of chemical processing machines and apparatus; Advisory and consultancy services relating to the design of metalworking machines and apparatus; Advisory and consultancy services relating to the design of plastic processing machines and apparatus; Advisory and consultancy services relating to the design of industrial machines used to process physical properties of matter and energy, as well as chemical properties; Advisory and consultancy services relating to the design of machines for depositing thin film synthetic polymers on semiconductor components, metal surfaces and electrical insulating materials; Advisory and consultancy services relating to the design of machines for depositing thin film synthetic polymers by chemical vapor deposition for metal surface processing; Advisory and consultancy services relating to the design of machines for depositing thin film synthetic polymers by chemical vapor deposition for semiconductor manufacturing; Advisory and consultancy services relating to the design of machines for depositing thin film synthetic polymers by chemical vapor deposition for plastic surface processing; Advisory and consultancy services relating to the design of machines for depositing thin films by chemical vapor deposition for glass surface processing; Advisory and consultancy services relating to the design of ion plating apparatus for metal surface processing; Advisory and consultancy services relating to the design of ion plating apparatus for semiconductor manufacturing; Advisory and consultancy services relating to the design of ion plating apparatus for plastic surface processing; Advisory and consultancy services relating to the design of ion plating apparatus for glass surface processing; Advisory and consultancy services relating to the design of sputtering apparatus for metal surface processing; Advisory and consultancy services relating to the design of sputtering apparatus for semiconductor manufacturing; Advisory and consultancy services relating to the design of sputtering apparatus for plastic surface processing; Advisory and consultancy services relating to the design of sputtering apparatus for glass surface processing; Advisory and consultancy services relating to the design of etching apparatus for metal surface processing; Advisory and consultancy services relating to the design of etching apparatus for semiconductor manufacturing; Advisory and consultancy services relating to the design of etching apparatus for plastic surface processing; Advisory and consultancy services relating to the design of etching apparatus for glass surface processing; Advisory and consultancy services relating to the design of vacuum evaporation apparatus for use in semiconductor processing; Advisory and consultancy services relating to the design of vacuum evaporation apparatus for metal surface processing in the semiconductor industry; Advisory and consultancy services relating to the design of vacuum evaporation apparatus for semiconductor manufacturing; Advisory and consultancy services relating to the design of vacuum evaporation apparatus for plastic surface processing; Advisory and consultancy services relating to the design of vacuum evaporation apparatus for glass surface processing; all of the above noted advisory and consultancy services provided to the order and/or specification of others |
Goods and Services | (Based on Sections 1(b) and 44(e)): Licensing of intellectual property rights |
Pseudo Mark | YOU TEC SUPPORT AND SERVICE |
International Class | 001 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins; unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry. |
US Class Codes | 001, 005, 006, 010, 026, 046 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 001 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs. |
US Class Codes | 013, 019, 021, 023, 031, 034, 035 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 007 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus. |
US Class Codes | 021, 023, 026, 036, 038 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 009 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 021 - Household or kitchen utensils and containers; combs and sponges; brushes (except paint brushes); brush-making materials; articles for cleaning purposes; steel-wool; unworked or semi-worked glass (except glass used in building); glassware, porcelain and earthenware not included in other classes. |
US Class Codes | 002, 013, 023, 029, 030, 033, 040, 050 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 021 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 037 - Building construction; repair; installation services. |
US Class Codes | 100, 103, 106 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 037 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 040 - Treatment of materials. |
US Class Codes | 100, 103, 106 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 040 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 042 - Scientific and technological services and research and design relating thereto; industrial analysis and research services; design and development of computer hardware and software. |
US Class Codes | 100, 101 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 042 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 045 - Legal services; security services for the protection of property and individuals; personal and social services rendered by others to meet the needs of individuals. |
US Class Codes | 100, 101 |
Class Status Code | 6 - Active |
Class Status Date | Tuesday, October 4, 2016 |
Primary Code | 045 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
Party Name | YOUTEC CO., LTD. |
Party Type | 20 - Owner at Publication |
Legal Entity Type | 03 - Corporation |
Address | Chiba 270-0156 JP |
Party Name | YOUTEC CO., LTD. |
Party Type | 10 - Original Applicant |
Legal Entity Type | 03 - Corporation |
Address | Chiba 270-0156 JP |
Event Date | Event Description |
Monday, January 14, 2019 | ABANDONMENT NOTICE E-MAILED - NO USE STATEMENT FILED |
Monday, January 14, 2019 | ABANDONMENT - NO USE STATEMENT FILED |
Tuesday, June 12, 2018 | NOA E-MAILED - SOU REQUIRED FROM APPLICANT |
Tuesday, April 17, 2018 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
Tuesday, April 17, 2018 | PUBLISHED FOR OPPOSITION |
Wednesday, March 28, 2018 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
Tuesday, March 13, 2018 | ELECTRONIC RECORD REVIEW COMPLETE |
Friday, March 9, 2018 | ON HOLD - ELECTRONIC RECORD REVIEW REQUIRED |
Sunday, March 4, 2018 | APPROVED FOR PUB - PRINCIPAL REGISTER |
Friday, March 2, 2018 | TEAS/EMAIL CORRESPONDENCE ENTERED |
Friday, March 2, 2018 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Wednesday, February 28, 2018 | ASSIGNED TO LIE |
Monday, February 26, 2018 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
Monday, February 12, 2018 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
Monday, February 12, 2018 | NON-FINAL ACTION E-MAILED |
Monday, February 12, 2018 | NON-FINAL ACTION WRITTEN |
Thursday, February 1, 2018 | TEAS/EMAIL CORRESPONDENCE ENTERED |
Wednesday, January 31, 2018 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Wednesday, January 31, 2018 | TEAS RESPONSE TO SUSPENSION INQUIRY RECEIVED |
Friday, January 26, 2018 | NOTIFICATION OF INQUIRY AS TO SUSPENSION E-MAILED |
Friday, January 26, 2018 | INQUIRY TO SUSPENSION E-MAILED |
Friday, January 26, 2018 | SUSPENSION INQUIRY WRITTEN |
Wednesday, January 17, 2018 | LIE CHECKED SUSP - TO ATTY FOR ACTION |
Thursday, January 11, 2018 | ASSIGNED TO LIE |
Wednesday, June 7, 2017 | NOTIFICATION OF LETTER OF SUSPENSION E-MAILED |
Wednesday, June 7, 2017 | LETTER OF SUSPENSION E-MAILED |
Wednesday, June 7, 2017 | SUSPENSION LETTER WRITTEN |
Saturday, June 3, 2017 | TEAS/EMAIL CORRESPONDENCE ENTERED |
Friday, June 2, 2017 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Friday, June 2, 2017 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
Monday, January 9, 2017 | NOTIFICATION OF NON-FINAL ACTION E-MAILED |
Monday, January 9, 2017 | NON-FINAL ACTION E-MAILED |
Monday, January 9, 2017 | NON-FINAL ACTION WRITTEN |
Friday, January 6, 2017 | ASSIGNED TO EXAMINER |
Wednesday, October 5, 2016 | NOTICE OF DESIGN SEARCH CODE E-MAILED |
Tuesday, October 4, 2016 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM |
Monday, October 3, 2016 | NEW APPLICATION ENTERED IN TRAM |