THE GAS PROFESSIONALS Trademark

Trademark Overview


On Friday, December 23, 2022, a trademark application was filed for THE GAS PROFESSIONALS with the United States Patent and Trademark Office. The USPTO has given the THE GAS PROFESSIONALS trademark a serial number of 79363755. The federal status of this trademark filing is FINAL REFUSAL - MAILED as of Thursday, June 6, 2024. This trademark is owned by NIPPON SANSO HOLDINGS CORPORATION. The THE GAS PROFESSIONALS trademark is filed in the Chemical Products category with the following description:

Industrial chemicals; gases for industrial use, namely, gases, not being fuels, for general industrial use, namely, 1,1,1,2-tetrafluoroethane, 1,1,1-trichloro-2,2,2-trifluoroethane, 1,1,1-trichloroethane, 1,1,2,2-tetrachloroethane, 1,1,2-trichloro-1,2,2-trifluoroethane, 1,1,2-trichloroethane,1,1- dichloroethylene, 1,1-difluoroethane, 1,2-dichlorotetrafluoroethane, 1,3-butadiene, 1-butene, 1-chloro-2-propanol, 1-chloropropane, 1-hexene, 1-octene, 1-pentene, 2,2,4-trimethylpentane, 2,3-dimethylbutane, 2,4-dimethylpentane, 2,5-dimethylthiophene, 2-ethylbutene-1, 2-hexene, 2-methylbutyraldehyde, 2-methyl-1-butene, 2-methyl-2-butene, 2-methylbutane, 2-methylhexane, 2-methylpentane, 2-methylthiophene, 2-pentene, 2-propanol, 3,3-dimethyl-1-butene, 3-methyl 1-butene, 3-methylpentane, 4-methyl-1-pentene, 4-vinylcyclohexene, carbon monoxide, carbon dioxide and nitrogen, ethanol in air, acetaldehyde, acetone, acetonitrile, acetylacetone, acetylene, acrolein, acrylonitrile, acrylonitrile, compress...
the gas professionals

General Information


Serial Number79363755
Word MarkTHE GAS PROFESSIONALS
Filing DateFriday, December 23, 2022
Status645 - FINAL REFUSAL - MAILED
Status DateThursday, June 6, 2024
Registration Number0000000
Registration DateNOT AVAILABLE
Mark Drawing5 - Drawing with word(s) / letter(s) / number(s) in Stylized form
Published for Opposition DateNOT AVAILABLE

Trademark Statements


Goods and ServicesIndustrial chemicals; gases for industrial use, namely, gases, not being fuels, for general industrial use, namely, 1,1,1,2-tetrafluoroethane, 1,1,1-trichloro-2,2,2-trifluoroethane, 1,1,1-trichloroethane, 1,1,2,2-tetrachloroethane, 1,1,2-trichloro-1,2,2-trifluoroethane, 1,1,2-trichloroethane,1,1- dichloroethylene, 1,1-difluoroethane, 1,2-dichlorotetrafluoroethane, 1,3-butadiene, 1-butene, 1-chloro-2-propanol, 1-chloropropane, 1-hexene, 1-octene, 1-pentene, 2,2,4-trimethylpentane, 2,3-dimethylbutane, 2,4-dimethylpentane, 2,5-dimethylthiophene, 2-ethylbutene-1, 2-hexene, 2-methylbutyraldehyde, 2-methyl-1-butene, 2-methyl-2-butene, 2-methylbutane, 2-methylhexane, 2-methylpentane, 2-methylthiophene, 2-pentene, 2-propanol, 3,3-dimethyl-1-butene, 3-methyl 1-butene, 3-methylpentane, 4-methyl-1-pentene, 4-vinylcyclohexene, carbon monoxide, carbon dioxide and nitrogen, ethanol in air, acetaldehyde, acetone, acetonitrile, acetylacetone, acetylene, acrolein, acrylonitrile, acrylonitrile, compressed air, allene, ammonia, antimony pentafluoride, argon, argon and carbon dioxide mixture, argon and helium mixture, argon and oxygen mixture, arsenic fluoride, arsenic pentafluoride, arsine, benzene, benzoic acid, benzyl-D7 chlonde, bis, 2-methoxyethyl adipate, boron trichloride, boron trifluoride, bromine pentafluoride, bromine trifluoride, bromochlorodifluoromethane, bromotrifluoroethylene, butadiene, butyl benzene, butyl mercaptan, butyl nitrate, calibration gas, carbon dioxide, carbon dioxide in argon and helium mixture, carbon disulfide, carbon monoxide, carbon monoxide in air, carbon monoxide in nitrogen, carbon tetrachloride, carbonyl fluoride, carbonyl sulfide, chlorine, chlorine trifluoride, chlorobenzene, chlorodifluoromethane, chloroform, chloroiodomethane, chloropentafluoroethane, chlorotrifluoromethane, cinnamaldehyde, cis-1,2-dichloroethylene, cis-2-butene, cis-2-pentene, cumene, cyanogen, cyanogen chloride, cyclohexane, cyclohexanone, cyclopentane, cyclopropane, deuterium, diborane, dibromomethane, dibutyl ether, dichlorodifluoromethane, dichloromethane, dichloromonofluoromethane, dichlorosilane, dichlorotetrafluoroethane, diethyl disufide, diethyl telluride, difluorodibromomethane, difluoromonochloroethane, digermane, dimethyl ether, dimethyl sulfate, dimethyl sulfide, dimethyl sulfoxide, dimethylamine, dimethyl zinc, dipropyl ether, disilane, dodecane, 2-chloro-1-difluoromethoxy-l, 1,2-trifluoroethane, ethane, ethanol, ethyl acetate, ethyl acetylene, ethyl acrylate, ethyl alcohol, ethyl benzene, ethyl chloride, ethyl cyclohexane, ethyl ether, ethyl formate, ethyl mercaptan, ethyl methyl sulfide, ethyl sulfide, ethylamine, ethylene, ethylene dichloride, ethylene glycol, ethylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene oxide and nitrogen, ethyleneoxide, fluorine, trifluoromethane, fluorotrichloromethane, 2-chloro-2-difluoromethoxy-1, 1, 1-trifluoroethane, formaldehyde gas, furan, furfuryl alcohol, germanium tetrachloride, germanium tetrahydride, trichlorofluoromethane, chlorotrifluoroethylene, trichlorotrifluoroethane, 1,2-dichloro 1,1,2,2-tetrafluoroethane, hexafluoroethane, dichlorodifluoromethane, chlorotrifluoromethane, 1,1,1, 2-tetrafluoroethane, bromotrifluoromethane, carbon tetrafluoride, monochlorodifluoromethane, trifluoromethane, octafluorocyclobutane, 1,1,1 trifluoro-2-chloro-2-bromoethane, helium, heptane, hexafluoroethane, hexafluoropropene, hexafluorpropylene, hydriodic acid, hydrogen, hydrogen bromide, hydrogen chloride, hydrogen cyanide, hydrogen fluoride, hydrogen selenide, hydrogen sulfide, hydrogen iodide, iodine pentafluoride, isobutane, isobutene, isobutyl alcohol, isobutyl nitrate, isobutylene, isohexene, isopentane, isoprene, isopropyl alcohol, isopropyl chloride, isopropyl ether, isopropyl mercaptan, krypton, methane, methane in argon, helium and nitrogen or air mixture, methane, methane and hydrogen gas mixture, methanol, methoxyflurane, methyl acetate, methyl acetylene, methyl acrylate, methyl alcohol, methyl bromide, methyl chloride, methyl chloroform, methyl disulfide, methyl ethyl ketone, methyl fluoride, methyl formate, methyl iodide, methyl isobutyl ketone, methyl mercaptan, methyl methacrylate, methyl propionate, methyl salicylate, methyl tert-butyl ether, methyl vinyl ketone, dimethoxymethane, methylamine, methylcyclopentane, methylene bromide, methylene fluoride, monomethylamine, m-xylene, n-amylamine, naphthalene, n-butane, n-butyl acetate, n-butyl alcohol, n-butyl sulfide, n-butyraldehyde, n-decane, neohexane, neon, neopentane, n-heptane, n-hexane, nickel carbonyl, nitrogen, nitric oxide, nitric oxide and nitrogen mixture, nitric oxide and sulfur dioxide and nitrogen gas mixture, nitrogen dioxide, nitrogen trifluoride, nitrosyl chloride, nitrous oxide, n-octane, nonane, n-pentane, n-propyl acetate, n-propyl alcohol, octafluorocyclobutanem, octafluorocyclopentene, octane, o-dichlorobenzene, oxides of nitrogen in nitrogen, oxygen in nitrogen, oxygen, compressed gas, oxygen and nitrogen gas mixture, o-xylene, pentane, perfluoro-2-butene, perfluoropropane, permanganate and alkali impregnated diatomaceous earth, phosgene, phosphine, phosphorus pentafluoride, phosphorus trifluoride, piperidine, propane, propane in air, propane in nitrogen, propionaldehyde, propyl mercaptan, propylene, propylene oxide, p-xylene, pyridine, arsenic fluoride, arsine, boron trifluoride, germanium tetrafluoride, silicon tetrafluoride, sec-butyl alcohol, silane, silicon tetrachloride, silicon tetrafluoride, sodium dichromate, sodium metal, styrene, styrene monomer, sulfur dioxide, sulfur dioxide in air, sulfur dioxide in nitrogen, sulfur dioxide and nitrogen mixture, sulfur hexafluoride, sulfur tetrafluoride, sulfuryl fluoride, tert-butyl chloride, tert-butyl mercaptan, tetrachloroethylene, tetraethylene glycol dimethyl ether, tetraethylorthosilicate, tetrafluoroethylene, tetrafluoromethane, tetrahydrofuran, tetrahydronaphithalene, thiophene, titanium tetrachloride, toluene, trans-l,2-dichloroethylene, trans-2-butene, trans-2-pentene, trans-3-hexene, trans-3-hexene, transition metal salt impregnated diatomaceous earth, trichloroethylene, trichlorosilane, triethyl phosphite, triethylene glycol, trifluorochloroethylene, trifluoromonobromomethane, trimethyl phosphite, trimethylamine, tungsten hexafluoride, undecane, valeraldehyde, vinyl acetate, vinyl bromide, vinyl chloride, vinyl fluoride, vinyl methyl ether, vinylidene chloride, vinylidene fluoride, xenon, zinc arsenide; stable isotope labeled chemical compounds for industrial use and research use; biochemical products used for scientific research, namely, cell culture media used in microbiology and tissue cultures; reagents for research purposes; gases for welding

Classification Information


International Class001 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins; unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
US Class Codes001, 005, 006, 010, 026, 046
Class Status Code6 - Active
Class Status DateMonday, February 27, 2023
Primary Code001
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History


Party NameNIPPON SANSO HOLDINGS CORPORATION
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressJP

Trademark Events


Event DateEvent Description
Friday, February 24, 2023SN ASSIGNED FOR SECT 66A APPL FROM IB
Monday, February 27, 2023NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Friday, March 3, 2023APPLICATION FILING RECEIPT MAILED
Sunday, September 24, 2023ASSIGNED TO EXAMINER
Wednesday, October 11, 2023NON-FINAL ACTION WRITTEN
Tuesday, October 24, 2023NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Thursday, October 12, 2023NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Tuesday, October 24, 2023REFUSAL PROCESSED BY MPU
Monday, November 13, 2023REFUSAL PROCESSED BY IB
Monday, April 22, 2024TEAS/EMAIL CORRESPONDENCE ENTERED
Monday, April 22, 2024TEAS RESPONSE TO OFFICE ACTION RECEIVED
Monday, April 22, 2024CORRESPONDENCE RECEIVED IN LAW OFFICE
Thursday, June 6, 2024FINAL REFUSAL E-MAILED
Thursday, June 6, 2024FINAL REFUSAL WRITTEN
Sunday, July 21, 2024NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
Monday, July 22, 2024NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Sunday, August 11, 2024NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
Thursday, June 6, 2024NOTIFICATION OF FINAL REFUSAL EMAILED