NOVASIC Trademark

Trademark Overview


On Tuesday, September 27, 2022, a trademark application was filed for NOVASIC with the United States Patent and Trademark Office. The USPTO has given the NOVASIC trademark a serial number of 79358894. The federal status of this trademark filing is REGISTERED as of Tuesday, May 28, 2024. This trademark is owned by NOVASIC. The NOVASIC trademark is filed in the Treatment & Processing of Materials Services, Computer & Software Products & Electrical & Scientific Products, and Computer & Software Services & Scientific Services categories with the following description:

mechanical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to machining operations, namely, processing for conducting cuts, meplats, bevels; mechanical, chemical and optical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to for surface preparation operations, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; other mechanical, chemical and physical surface treatments, , used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; surface characterization process being, physical, chemical and optical, namely, topography, roughness and chemical analysis; structure characterization method being chemical or physical, namely, morphology and crystal structure; all these services being provided in the field of semiconductor or piezoelectric materials or oxides ...

Single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different machining operations, namely, operations for conducting cuts, meplats, bevels; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface preparation operations ready for epitaxy or bonding, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components; all these goods being used in precision grinding, mechanical and chemical mechanical polishing (CMP) operations and other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or fo...

Testing of machining techniques, namely, technical tests and trials for conducting cuts, meplats, bevels; testing and tests of surface preparation techniques, namely, technical testing and testing of lapping, precision grinding, mechanical and chemical mechanical polishing (CMP), cleaning, laser marking; technical tests of other surface treatments for others in the field of materials used to for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; research and development for new products for others; research and development of new consumable products for others used in machining operations, namely, operations for conducting cuts, meplats, bevels; research and development of new consumable products for others for use in surface preparation operations, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; research and developme...
novasic

General Information


Serial Number79358894
Word MarkNOVASIC
Filing DateTuesday, September 27, 2022
Status700 - REGISTERED
Status DateTuesday, May 28, 2024
Registration Number7394032
Registration DateTuesday, May 28, 2024
Mark Drawing4 - Illustration: Drawing with word(s) / letter(s) / number(s) in Block form
Published for Opposition DateTuesday, March 12, 2024

Trademark Statements


Goods and Servicesmechanical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to machining operations, namely, processing for conducting cuts, meplats, bevels; mechanical, chemical and optical treatment of wafers of semiconductor or piezoelectric materials or oxides relating to for surface preparation operations, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; other mechanical, chemical and physical surface treatments, , used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; surface characterization process being, physical, chemical and optical, namely, topography, roughness and chemical analysis; structure characterization method being chemical or physical, namely, morphology and crystal structure; all these services being provided in the field of semiconductor or piezoelectric materials or oxides for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling
Goods and ServicesSingle-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different machining operations, namely, operations for conducting cuts, meplats, bevels; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface preparation operations ready for epitaxy or bonding, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; single-layer or multilayer wafers of semiconductor or piezoelectric materials or oxides having received different surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components; all these goods being used in precision grinding, mechanical and chemical mechanical polishing (CMP) operations and other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling
Goods and ServicesTesting of machining techniques, namely, technical tests and trials for conducting cuts, meplats, bevels; testing and tests of surface preparation techniques, namely, technical testing and testing of lapping, precision grinding, mechanical and chemical mechanical polishing (CMP), cleaning, laser marking; technical tests of other surface treatments for others in the field of materials used to for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; research and development for new products for others; research and development of new consumable products for others used in machining operations, namely, operations for conducting cuts, meplats, bevels; research and development of new consumable products for others for use in surface preparation operations, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; research and development of new consumables for others used in other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; technical advice for conducting machining operations, namely, operations for conducting cuts, meplats, bevels; technical advice for conducting surface preparation operations, namely, lapping, precision grinding, mechanical and chemical mechanical (CMP) polishing, cleaning, laser marking operations; technical advice for conducting other surface treatments in the field of materials used for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding or for wafer recycling; technical advice for surface characterization, namely, topography, roughness and chemical analysis; technical advice for structure characterization, namely, morphology and crystallography; all these services being provided in the field of semiconductor or piezoelectric materials or oxides for obtaining electronic or opto-electronic or photonic components or for layer growth by epitaxy or for molecular bonding

Classification Information


International Class040 - Treatment of materials.
US Class Codes100, 103, 106
Class Status Code6 - Active
Class Status DateTuesday, January 3, 2023
Primary Code040
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

International Class009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus.
US Class Codes021, 023, 026, 036, 038
Class Status Code6 - Active
Class Status DateTuesday, January 3, 2023
Primary Code009
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

International Class042 - Scientific and technological services and research and design relating thereto; industrial analysis and research services; design and development of computer hardware and software.
US Class Codes100, 101
Class Status Code6 - Active
Class Status DateTuesday, January 3, 2023
Primary Code042
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History


Party NameNOVASIC
Party Type30 - Original Registrant
Legal Entity Type34 - NOT AVAILABLE
AddressFR

Party NameNOVASIC
Party Type20 - Owner at Publication
Legal Entity Type34 - NOT AVAILABLE
AddressFR

Party NameNOVASIC
Party Type10 - Original Applicant
Legal Entity Type34 - NOT AVAILABLE
AddressFR

Trademark Events


Event DateEvent Description
Wednesday, July 26, 2023NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Friday, December 30, 2022SN ASSIGNED FOR SECT 66A APPL FROM IB
Tuesday, January 3, 2023NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Saturday, January 7, 2023APPLICATION FILING RECEIPT MAILED
Wednesday, July 12, 2023ASSIGNED TO EXAMINER
Tuesday, July 25, 2023NON-FINAL ACTION WRITTEN
Saturday, August 19, 2023REFUSAL PROCESSED BY MPU
Saturday, August 19, 2023NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Wednesday, September 13, 2023REFUSAL PROCESSED BY IB
Thursday, January 18, 2024TEAS CHANGE OF OWNER ADDRESS RECEIVED
Thursday, January 18, 2024APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Thursday, January 18, 2024TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Thursday, January 18, 2024ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Thursday, January 18, 2024TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
Tuesday, February 6, 2024NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED
Thursday, January 18, 2024TEAS CHANGE OF CORRESPONDENCE RECEIVED
Tuesday, February 6, 2024EXAMINERS AMENDMENT -WRITTEN
Tuesday, February 6, 2024EXAMINERS AMENDMENT E-MAILED
Tuesday, February 6, 2024EXAMINER'S AMENDMENT ENTERED
Tuesday, February 6, 2024APPROVED FOR PUB - PRINCIPAL REGISTER
Wednesday, February 21, 2024NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Wednesday, February 21, 2024NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB
Wednesday, February 21, 2024OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Wednesday, February 21, 2024NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Tuesday, March 12, 2024PUBLISHED FOR OPPOSITION
Tuesday, March 12, 2024NOTIFICATION PROCESSED BY IB
Thursday, April 11, 2024TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS
Tuesday, March 12, 2024OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Thursday, April 11, 2024ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Thursday, April 11, 2024TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Thursday, April 11, 2024TEAS CHANGE OF CORRESPONDENCE RECEIVED
Tuesday, May 28, 2024REGISTERED-PRINCIPAL REGISTER
Tuesday, May 28, 2024NOTICE OF REGISTRATION CONFIRMATION EMAILED