| Serial Number | 79360593 |
| Word Mark | LASERTEC |
| Filing Date | Wednesday, October 26, 2022 |
| Status | 700 - REGISTERED |
| Status Date | Tuesday, May 7, 2024 |
| Registration Number | 7376555 |
| Registration Date | Tuesday, May 7, 2024 |
| Mark Drawing | 5 - Drawing with word(s) / letter(s) / number(s) in Stylized form |
| Published for Opposition Date | Tuesday, February 20, 2024 |
| Description of Mark | The mark consists of the stylized wording "LASERTEC". |
| Goods and Services | Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus |
| Goods and Services | Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays |
| Pseudo Mark | LASER TEC; LASER TECH |
| International Class | 007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs. |
| US Class Codes | 013, 019, 021, 023, 024, 031, 034, 035 |
| Class Status Code | 6 - Active |
| Class Status Date | Friday, January 20, 2023 |
| Primary Code | 007 |
| First Use Anywhere Date | NOT AVAILABLE |
| First Use In Commerce Date | NOT AVAILABLE |
| International Class | 009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus. |
| US Class Codes | 021, 023, 026, 036, 038 |
| Class Status Code | 6 - Active |
| Class Status Date | Friday, January 20, 2023 |
| Primary Code | 009 |
| First Use Anywhere Date | NOT AVAILABLE |
| First Use In Commerce Date | NOT AVAILABLE |
| Party Name | Lasertec Corporation |
| Party Type | 30 - Original Registrant |
| Legal Entity Type | 03 - Corporation |
| Address | JP |
| Party Name | Lasertec Corporation |
| Party Type | 20 - Owner at Publication |
| Legal Entity Type | 03 - Corporation |
| Address | JP |
| Party Name | Lasertec Corporation |
| Party Type | 10 - Original Applicant |
| Legal Entity Type | 03 - Corporation |
| Address | JP |
| Event Date | Event Description |
| Thursday, January 19, 2023 | SN ASSIGNED FOR SECT 66A APPL FROM IB |
| Friday, January 20, 2023 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED |
| Friday, January 20, 2023 | LIMITATION FROM ORIGINAL APPLICATION ENTERED |
| Tuesday, January 24, 2023 | APPLICATION FILING RECEIPT MAILED |
| Tuesday, May 9, 2023 | ASSIGNED TO EXAMINER |
| Wednesday, May 10, 2023 | NON-FINAL ACTION WRITTEN |
| Thursday, May 11, 2023 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| Tuesday, June 20, 2023 | REFUSAL PROCESSED BY MPU |
| Tuesday, June 20, 2023 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
| Tuesday, July 11, 2023 | REFUSAL PROCESSED BY IB |
| Thursday, July 20, 2023 | TEAS CHANGE OF OWNER ADDRESS RECEIVED |
| Thursday, July 20, 2023 | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED |
| Thursday, July 20, 2023 | TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED |
| Thursday, July 20, 2023 | ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED |
| Thursday, July 20, 2023 | TEAS CHANGE OF DOMESTIC REPRESENTATIVES ADDRESS |
| Thursday, July 20, 2023 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
| Thursday, December 7, 2023 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
| Thursday, December 7, 2023 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
| Friday, December 8, 2023 | TEAS/EMAIL CORRESPONDENCE ENTERED |
| Tuesday, January 2, 2024 | EXAMINERS AMENDMENT -WRITTEN |
| Tuesday, January 2, 2024 | EXAMINERS AMENDMENT E-MAILED |
| Tuesday, January 2, 2024 | NOTIFICATION OF EXAMINERS AMENDMENT E-MAILED |
| Tuesday, January 2, 2024 | EXAMINER'S AMENDMENT ENTERED |
| Wednesday, January 17, 2024 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| Wednesday, January 31, 2024 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
| Wednesday, January 31, 2024 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| Saturday, February 3, 2024 | NEW REPRESENTATIVE AT IB RECEIVED |
| Wednesday, February 7, 2024 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
| Wednesday, February 7, 2024 | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB |
| Tuesday, February 20, 2024 | PUBLISHED FOR OPPOSITION |
| Monday, February 26, 2024 | NOTIFICATION PROCESSED BY IB |
| Monday, March 4, 2024 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| Tuesday, May 7, 2024 | REGISTERED-PRINCIPAL REGISTER |
| Tuesday, May 7, 2024 | NOTICE OF REGISTRATION CONFIRMATION EMAILED |
| Wednesday, August 7, 2024 | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB |
| Saturday, November 2, 2024 | FINAL DISPOSITION PROCESSED |
| Sunday, November 3, 2024 | FINAL DISPOSITION NOTICE SENT TO IB |