Chemical preparations for forming resist lower-layer films in multi-layer resist films for use in lithography processes; photographic supplies, namely, photometric paper, diazo paper, cinematographic film, sensitized but not exposed, sensitized photographic films, unexposed, x-ray films, sensitized but not exposed, photographic emulsions, photographic sensitizers, sensitized paper for photography, sensitized photographic dry plates, sensitized cloth for photography, photographic dry plates, l...