NANOCLEAN
MACHINES FOR CLEANING HIGH-TECHNOLOGY MANUFACTURING AND DEVICE SURFACES, NAMELY, SEMICONDUCTOR MANUFACTURING SURFACES, MICROELECTROMECHANICAL SYSTEM (MEMS) MANUFACTURING SURFACES, SENSOR HEADS, SPACE INSTRUMENTATION SURFACES, SATELLITE INSTRUMENTATION SURFACES, SOLAR CELLS, AND ELECTRICAL CONTACT SURFACES, USING HIGH-VELOCITY LIQUID PARTICLE CLUSTERS
Abandoned · December 18, 2001 · 76350390 ·