EQUIPMENT, NAMELY, ELLIPSOMETER BASED APPARATUS FOR MEASURING THICKNESS AND OPTICAL PROPERTIES OF SEMICONDUCTOR, DISK DRIVE, MAGNETIC DATA STORAGE MEDIA, OPTICAL DATA STORAGE MEDIA, THIN FILMS AND MULTIPLE LAYER FILMS ON SUBSTRATES AND COATINGS, INCLUDING TEMPERATURE CAUSED EFFECTS, AND COMPUTER PROGRAMS NECESSARY FOR CONTROLLING THE ELLIPSOMETER BASED APPARATUS AND FOR ANALYZING ACQUIRED ELLIPSOMETRIC DATA