EPIMETRIC
IN-SITU REFLECTIVITY SYSTEM; NAMELY, A REFLECTOMETER INCLUDING A LIGHT SOURCE, AN OPTICAL FIBER BUNDLE AND LIGHT DETECTORS, AS WELL AS A COMPUTER AND SPECIALIZED SOFTWARE FOR THE IN-SITU MEASUREMENT OF THE GROWTH RATE AND OTHER FILM PROPERTIES INSIDE A MOCVD REACTOR
Cancelled · May 16, 2000 · 76049501 ·