DPS CENTURA Trademark

Trademark Overview

On Friday, August 25, 1995, a trademark application was filed for DPS CENTURA with the United States Patent and Trademark Office. The USPTO has given the DPS CENTURA trademark a serial number of 74736774. The federal status of this trademark filing is REGISTERED AND RENEWED as of Friday, April 27, 2018. This trademark is owned by Applied Materials, Inc.. The DPS CENTURA trademark is filed in the Computer & Software Products & Electrical & Scientific Products and Construction & Repair Services categories with the following description:

semiconductor wafer processing equipment and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanter therefor; semiconductor chemical mechanical polishers, and parts thereof; and computer programs for use therewith

[ repair and maintenance services for semiconductor wafer processing equipment ]
dps centura

General Information

Serial Number74736774
Word MarkDPS CENTURA
Filing DateFriday, August 25, 1995
Status800 - REGISTERED AND RENEWED
Status DateFriday, April 27, 2018
Registration Number2201675
Registration DateTuesday, November 3, 1998
Mark Drawing1 - Typeset: Word(s) / letter(s) / number(s)
Published for Opposition DateTuesday, April 29, 1997

Trademark Statements

Goods and Servicessemiconductor wafer processing equipment and components, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanter therefor; semiconductor chemical mechanical polishers, and parts thereof; and computer programs for use therewith
Goods and Services[ repair and maintenance services for semiconductor wafer processing equipment ]

Classification Information

International Class009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus.
US Class Codes021, 023, 026, 036, 038
Class Status Code6 - Active
Class Status DateFriday, October 27, 1995
Primary Code009
First Use Anywhere DateSaturday, June 27, 1998
First Use In Commerce DateSaturday, June 27, 1998
International Class037 - Building construction; repair; installation services.
US Class Codes100, 103, 106
Class Status CodeB - Sec. 8 - Class(es) in a Multiple Class registration
Class Status DateFriday, April 27, 2018
Primary Code037
First Use Anywhere DateSaturday, June 27, 1998
First Use In Commerce DateSaturday, June 27, 1998

Trademark Owner History

Party NameApplied Materials, Inc.
Party Type30 - Original Registrant
Legal Entity Type03 - Corporation
AddressSanta Clara, CA 95054
Party NameApplied Materials, Inc.
Party Type20 - Owner at Publication
Legal Entity Type03 - Corporation
AddressSanta Clara, CA 95054
Party NameApplied Materials, Inc.
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressSanta Clara, CA 95054

Trademark Events

Event DateEvent Description
Friday, March 28, 1997NOTICE OF PUBLICATION
Monday, May 13, 1996ASSIGNED TO EXAMINER
Tuesday, May 14, 1996ASSIGNED TO EXAMINER
Tuesday, June 11, 1996ASSIGNED TO EXAMINER
Friday, July 12, 1996NON-FINAL ACTION MAILED
Monday, December 23, 1996EXAMINER'S AMENDMENT MAILED
Wednesday, January 29, 1997EXAMINER'S AMENDMENT MAILED
Wednesday, February 5, 1997APPROVED FOR PUB - PRINCIPAL REGISTER
Friday, October 29, 2004PAPER RECEIVED
Tuesday, April 29, 1997PUBLISHED FOR OPPOSITION
Tuesday, July 22, 1997NOA MAILED - SOU REQUIRED FROM APPLICANT
Friday, January 16, 1998SOU EXTENSION 1 FILED
Tuesday, March 17, 1998SOU EXTENSION 1 GRANTED
Wednesday, July 22, 1998USE AMENDMENT FILED
Thursday, August 20, 1998STATEMENT OF USE PROCESSING COMPLETE
Saturday, August 29, 1998ASSIGNED TO EXAMINER
Monday, August 31, 1998ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
Tuesday, November 3, 1998REGISTERED-PRINCIPAL REGISTER
Thursday, October 30, 2008REGISTERED - COMBINED SECTION 8 (10-YR) & SEC. 9 FILED
Tuesday, December 22, 2009REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
Tuesday, December 22, 2009REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
Thursday, June 29, 2017TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Friday, October 29, 2004REGISTERED - SEC. 8 (6-YR) & SEC. 15 FILED
Friday, December 3, 2004REGISTERED - SEC. 8 (6-YR) ACCEPTED & SEC. 15 ACK.
Thursday, August 2, 2007CASE FILE IN TICRS
Thursday, October 30, 2008PAPER RECEIVED
Thursday, October 30, 2008REGISTERED - COMBINED SECTION 8 (10-YR) & SEC. 9 FILED
Thursday, November 20, 2008ASSIGNED TO PARALEGAL
Thursday, December 10, 2009POST REGISTRATION ACTION MAILED - SEC. 8 & 9
Thursday, June 29, 2017ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Friday, April 27, 2018REGISTERED AND RENEWED (SECOND RENEWAL - 10 YRS)
Friday, November 3, 2017COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED
Monday, November 13, 2017TEAS SECTION 8 & 9 RECEIVED
Saturday, December 9, 2017CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Tuesday, December 12, 2017POST REGISTRATION ACTION MAILED - SEC. 8 & 9
Thursday, April 26, 2018TEAS RESPONSE TO OFFICE ACTION-POST REG RECEIVED
Friday, April 27, 2018REGISTERED - PARTIAL SEC. 8 (10-YR) ACCEPTED
Friday, April 27, 2018REGISTERED - SEC. 9 GRANTED/CHECK RECORD FOR SEC. 8
Friday, August 9, 2024TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Friday, August 9, 2024TEAS CHANGE OF OWNER ADDRESS RECEIVED
Friday, August 9, 2024APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Friday, August 9, 2024TEAS CHANGE OF CORRESPONDENCE RECEIVED
Friday, August 9, 2024ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Friday, April 27, 2018NOTICE OF ACCEPTANCE OF SEC. 8 - E-MAILED

Related Keywords

centura reactors semiconductor vapor deposition chemical wafer equipment processing computer thereof