CMC MATERIALS Trademark

Trademark Overview


On Monday, December 9, 2019, a trademark application was filed for CMC MATERIALS with the United States Patent and Trademark Office. The USPTO has given the CMC MATERIALS trademark a serial number of 88719666. The federal status of this trademark filing is REGISTERED as of Tuesday, March 8, 2022. This trademark is owned by Cabot Microelectronics Corporation. The CMC MATERIALS trademark is filed in the Chemical Products, Cosmetics & Cleaning Products, and Machinery Products categories with the following description:

Non-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industry

Industrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and heads

Chemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth, or otherwise modify their chemical-mechanical properties; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth or otherwise modify their mechanical, physical, chemical and electrical properties; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (BTA) and L-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical ad...
cmc materials

General Information


Serial Number88719666
Word MarkCMC MATERIALS
Filing DateMonday, December 9, 2019
Status700 - REGISTERED
Status DateTuesday, March 8, 2022
Registration Number6667339
Registration DateTuesday, March 8, 2022
Mark Drawing3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s)
Published for Opposition DateTuesday, May 26, 2020

Trademark Statements


Description of MarkThe mark consists of horizontal wavy line with a horizontal straight line bisecting the wavy line equally to the left of the words "CMC MATERIALS".
Goods and ServicesNon-abrasive polishing pads for chemical-mechanical planarizing or chemical mechanical polishing (cmp) machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for polishing machines for use in the manufacture of semiconductor wafers, integrated circuits, hard disk drives and chipsets; Polishing pads for use in the manufacture of advanced integrated circuit devices within the semiconductor industry
Pseudo MarkCABOT MICROELECTRONICS CORPORATION MATERIALS
Goods and ServicesIndustrial abrasives, namely, abrasive compounds for lapping and polishing semiconductors, silicon wafers, glass and metal surfaces; Chemical cleaner directed to the electronics industry; Post-copper chemical mechanical planarization (cmp) cleaning solution for use in the manufacturing and processing of semiconductors; Chemical cleaning solution for processing of integrated circuit (ic) in the opto-electronics and photonics industries; Post-ash cleaning solution for use in the manufacturing and processing of semiconductors; Abrasive preparations, namely, chemical cleaners, namely, abrasive dispersion slurries and cleaning and polishing preparations for use in the finishing of electronic components and substrates, optical components, glass, metals, plastics, machinery, computer parts, magnetic data-storage disks and heads
Indication of Colors claimedColor is not claimed as a feature of the mark.
Goods and ServicesChemical slurry for polishing semiconductors; Chemical slurries for polishing semiconductors, silicon wafers, glass, metals, plastics, machinery, electronic components and substrates, optical components, computer parts, magnetic data-storage disks and heads for use in the semiconductor, electronic, rigid disk and magnetic head industries; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth, or otherwise modify their chemical-mechanical properties; Chemical slurries for polishing semiconductors used for the treatment of semiconductors to planarize, smooth or otherwise modify their mechanical, physical, chemical and electrical properties; Chemical solutions for use in the manufacturing and processing of semiconductors, namely, photoresist stripper, benzotriazole (BTA) and L-proline solution; Fumed silica dispensed in water used to polish semiconductors; Aqueous metal oxide dispersions for use in semiconductor polishing; Chemical additives, namely, abrasive dispersions for use in the manufacture of electronic components and substrates, optical components, metals, machinery, computer parts, and magnetic data-storage disks and heads; Chemical slurries for use in the manufacture of advanced integrated circuit devices within the semi-conductor industry; High purity chemical compositions for electronic component manufacture; Chemical compositions for use in semiconductor manufacturing, solar cell panel manufacturing and flat panel display manufacturing; Chemical compositions for removal of photoresist and post-etch residues in the manufacture of semiconductors, integrated circuits and related products; Chemicals for use in industry and science; Chemical preparations for use in industry and science, namely, for use in the semiconductor and micro-electronics industries; Chemical mechanical polishing (cmp) slurry and chemical mechanical planarization (cmp) slurry for use in the manufacturing and processing of semiconductors in the optoelectronics and photonics industries
Disclaimer with Predetermined Text"MATERIALS"

Classification Information


International Class001 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins; unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
US Class Codes001, 005, 006, 010, 026, 046
Class Status Code6 - Active
Class Status DateThursday, December 12, 2019
Primary Code001
First Use Anywhere DateMonday, May 24, 2021
First Use In Commerce DateMonday, May 24, 2021

International Class003 - Bleaching preparations and other substances for laundry use; cleaning, polishing, scouring and abrasive preparations; soaps; perfumery, essential oils, cosmetics, hair lotions; dentifrices.
US Class Codes001, 004, 006, 050, 051, 052
Class Status Code6 - Active
Class Status DateThursday, December 12, 2019
Primary Code003
First Use Anywhere DateMonday, May 17, 2021
First Use In Commerce DateMonday, May 17, 2021

International Class007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
US Class Codes013, 019, 021, 023, 024, 031, 034, 035
Class Status Code6 - Active
Class Status DateThursday, December 12, 2019
Primary Code007
First Use Anywhere DateWednesday, May 19, 2021
First Use In Commerce DateWednesday, May 19, 2021

Trademark Owner History


Party NameCMC MATERIALS LLC
Party Type31 - New Owner After Registration
Legal Entity Type16 - Limited Liability Company
AddressWILMINGTON, DE 19801

Party NameCMC MATERIALS, INC.
Party Type30 - Original Registrant
Legal Entity Type03 - Corporation
AddressAURORA, IL 60504

Party NameCMC MATERIALS, INC.
Party Type21 - New Owner After Publication
Legal Entity Type03 - Corporation
AddressAURORA, IL 60504

Party NameCabot Microelectronics Corporation
Party Type20 - Owner at Publication
Legal Entity Type03 - Corporation
AddressAurora, IL 60504

Party NameCabot Microelectronics Corporation
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressAurora, IL 60504

Trademark Events


Event DateEvent Description
Wednesday, October 18, 2023AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
Wednesday, August 9, 2023TEAS CHANGE OF CORRESPONDENCE RECEIVED
Wednesday, August 9, 2023ATTORNEY/DOM.REP.REVOKED AND/OR APPOINTED
Wednesday, August 9, 2023TEAS REVOKE/APP/CHANGE ADDR OF ATTY/DOM REP RECEIVED
Wednesday, August 9, 2023APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Wednesday, August 9, 2023TEAS CHANGE OF OWNER ADDRESS RECEIVED
Tuesday, March 8, 2022REGISTERED-PRINCIPAL REGISTER
Wednesday, February 2, 2022NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED
Tuesday, February 1, 2022ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
Tuesday, February 1, 2022NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Monday, January 31, 2022STATEMENT OF USE PROCESSING COMPLETE
Friday, January 21, 2022USE AMENDMENT FILED
Monday, January 31, 2022SOU EXTENSION 3 GRANTED
Friday, January 21, 2022SOU EXTENSION 3 FILED
Monday, January 31, 2022CASE ASSIGNED TO INTENT TO USE PARALEGAL
Friday, January 21, 2022SOU TEAS EXTENSION RECEIVED
Friday, January 21, 2022TEAS STATEMENT OF USE RECEIVED
Friday, July 23, 2021NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Wednesday, July 21, 2021SOU EXTENSION 2 GRANTED
Wednesday, July 21, 2021SOU EXTENSION 2 FILED
Wednesday, July 21, 2021SOU TEAS EXTENSION RECEIVED
Wednesday, May 12, 2021AUTOMATIC UPDATE OF ASSIGNMENT OF OWNERSHIP
Saturday, April 3, 2021PETITION TO DIRECTOR GRANTED
Tuesday, April 13, 2021ASSIGNED TO PETITION STAFF
Tuesday, April 13, 2021ASSIGNED TO PETITION STAFF
Friday, January 15, 2021NOTICE OF APPROVAL OF EXTENSION REQUEST E-MAILED
Wednesday, January 13, 2021SOU EXTENSION 1 GRANTED
Wednesday, January 13, 2021SOU EXTENSION 1 FILED
Wednesday, January 13, 2021SOU TEAS EXTENSION RECEIVED
Wednesday, January 13, 2021TEAS PETITION TO DIRECTOR RECEIVED
Tuesday, July 21, 2020NOA E-MAILED - SOU REQUIRED FROM APPLICANT
Tuesday, May 26, 2020OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Tuesday, May 26, 2020PUBLISHED FOR OPPOSITION
Wednesday, May 6, 2020NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Wednesday, April 22, 2020ASSIGNED TO LIE
Tuesday, April 14, 2020APPROVED FOR PUB - PRINCIPAL REGISTER
Monday, April 13, 2020TEAS/EMAIL CORRESPONDENCE ENTERED
Monday, April 13, 2020CORRESPONDENCE RECEIVED IN LAW OFFICE
Monday, April 13, 2020TEAS RESPONSE TO OFFICE ACTION RECEIVED
Tuesday, February 25, 2020NOTIFICATION OF NON-FINAL ACTION E-MAILED
Tuesday, February 25, 2020NON-FINAL ACTION E-MAILED
Tuesday, February 25, 2020NON-FINAL ACTION WRITTEN
Tuesday, February 25, 2020NON-FINAL ACTION WRITTEN
Tuesday, February 25, 2020NON-FINAL ACTION WRITTEN
Monday, February 24, 2020NOTIFICATION OF NON-FINAL ACTION E-MAILED
Monday, February 24, 2020NON-FINAL ACTION E-MAILED
Monday, February 24, 2020NON-FINAL ACTION WRITTEN
Monday, February 24, 2020ASSIGNED TO EXAMINER
Friday, December 13, 2019NOTICE OF DESIGN SEARCH CODE E-MAILED
Thursday, December 12, 2019NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Thursday, December 12, 2019NEW APPLICATION ENTERED