CLEAN ETCH Trademark

Trademark Overview

On Thursday, January 17, 2013, a trademark application was filed for CLEAN ETCH with the United States Patent and Trademark Office. The USPTO has given the CLEAN ETCH trademark a serial number of 85825553. The federal status of this trademark filing is REGISTERED AND RENEWED as of Wednesday, August 21, 2024. This trademark is owned by MITSUBISHI GAS CHEMICAL COMPANY, INC.. The CLEAN ETCH trademark is filed in the Chemical Products category with the following description:

((Chemical agents for etching of metals and printed circuit boards for use in the manufacturing of electronic components; Metal surface treating agents in the nature of etching solutions for use in the field of manufacturing electronics; chemical agents in the nature of polishing agents for smoothing metal surfaces in the field of manufacturing electronic components;)) chemical agents in the nature of resist stripping agents for removing photoresist used in the printed circuit board fabricating process ((; chemical agents in the nature of resist developing agents for removing photoresist used in the printed circuit board fabricating process))
clean etch

General Information

Serial Number85825553
Word MarkCLEAN ETCH
Filing DateThursday, January 17, 2013
Status800 - REGISTERED AND RENEWED
Status DateWednesday, August 21, 2024
Registration Number4589482
Registration DateTuesday, August 19, 2014
Mark Drawing4 - Illustration: Drawing with word(s) / letter(s) / number(s) in Block form
Published for Opposition DateTuesday, January 28, 2014

Trademark Statements

Goods and Services((Chemical agents for etching of metals and printed circuit boards for use in the manufacturing of electronic components; Metal surface treating agents in the nature of etching solutions for use in the field of manufacturing electronics; chemical agents in the nature of polishing agents for smoothing metal surfaces in the field of manufacturing electronic components;)) chemical agents in the nature of resist stripping agents for removing photoresist used in the printed circuit board fabricating process ((; chemical agents in the nature of resist developing agents for removing photoresist used in the printed circuit board fabricating process))
NOT AVAILABLE"ETCH"

Classification Information

International Class001 - Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins; unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
US Class Codes001, 005, 006, 010, 026, 046
Class Status Code6 - Active
Class Status DateWednesday, January 23, 2013
Primary Code001
First Use Anywhere DateWednesday, September 29, 2010
First Use In Commerce DateWednesday, September 29, 2010

Trademark Owner History

Party NameMITSUBISHI GAS CHEMICAL COMPANY, INC.
Party Type30 - Original Registrant
Legal Entity Type03 - Corporation
AddressChiyoda-ku, Tokyo 100-8324
JP
Party NameMITSUBISHI GAS CHEMICAL COMPANY, INC.
Party Type20 - Owner at Publication
Legal Entity Type03 - Corporation
AddressChiyoda-ku, Tokyo
JP
Party NameMITSUBISHI GAS CHEMICAL COMPANY, INC.
Party Type10 - Original Applicant
Legal Entity Type03 - Corporation
AddressChiyoda-ku, Tokyo
JP

Trademark Events

Event DateEvent Description
Wednesday, November 6, 2013TEAS RESPONSE TO OFFICE ACTION RECEIVED
Sunday, November 17, 2013TEAS/EMAIL CORRESPONDENCE ENTERED
Monday, January 21, 2013NEW APPLICATION ENTERED
Wednesday, January 23, 2013NEW APPLICATION OFFICE SUPPLIED DATA ENTERED
Tuesday, April 30, 2013ASSIGNED TO EXAMINER
Monday, May 6, 2013NON-FINAL ACTION WRITTEN
Monday, May 6, 2013NON-FINAL ACTION E-MAILED
Monday, May 6, 2013NOTIFICATION OF NON-FINAL ACTION E-MAILED
Tuesday, November 12, 2013ASSIGNED TO LIE
Sunday, November 17, 2013CORRESPONDENCE RECEIVED IN LAW OFFICE
Monday, June 30, 2014CASE ASSIGNED TO INTENT TO USE PARALEGAL
Monday, June 30, 2014STATEMENT OF USE PROCESSING COMPLETE
Wednesday, December 18, 2013APPROVED FOR PUB - PRINCIPAL REGISTER
Thursday, December 26, 2013LAW OFFICE PUBLICATION REVIEW COMPLETED
Wednesday, January 8, 2014NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED
Tuesday, January 28, 2014PUBLISHED FOR OPPOSITION
Tuesday, January 28, 2014OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED
Tuesday, March 25, 2014NOA E-MAILED - SOU REQUIRED FROM APPLICANT
Tuesday, June 3, 2014TEAS STATEMENT OF USE RECEIVED
Tuesday, June 3, 2014USE AMENDMENT FILED
Monday, June 22, 2020CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Wednesday, July 16, 2014ALLOWED PRINCIPAL REGISTER - SOU ACCEPTED
Thursday, July 17, 2014NOTICE OF ACCEPTANCE OF STATEMENT OF USE E-MAILED
Tuesday, August 19, 2014REGISTERED-PRINCIPAL REGISTER
Monday, August 19, 2019COURTESY REMINDER - SEC. 8 (6-YR) E-MAILED
Thursday, January 16, 2020TEAS SECTION 8 RECEIVED
Thursday, January 16, 2020TEAS SECTION 15 RECEIVED
Tuesday, June 23, 2020REGISTERED - SEC. 15 ACKNOWLEDGED
Tuesday, June 23, 2020NOTICE OF ACCEPTANCE OF SEC. 8 - E-MAILED
Tuesday, June 23, 2020REGISTERED - SEC. 8 (6-YR) ACCEPTED
Thursday, June 6, 2024TEAS SECTION 8 & 9 RECEIVED
Wednesday, August 21, 2024CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Wednesday, August 21, 2024REGISTERED AND RENEWED (FIRST RENEWAL - 10 YRS)
Wednesday, August 21, 2024REGISTERED - SEC. 8 (10-YR) ACCEPTED/SEC. 9 GRANTED
Wednesday, August 21, 2024NOTICE OF ACCEPTANCE OF SEC. 8 & 9 - E-MAILED
Tuesday, June 23, 2020SEC. 15 ACKNOWLEDGEMENT - E-MAILED
Saturday, August 19, 2023COURTESY REMINDER - SEC. 8 (10-YR)/SEC. 9 E-MAILED

Related Keywords

etch clean agents chemical nature manufacturing circuit printed removing photoresist field board