CEX Trademark

Trademark Overview


On Tuesday, May 27, 2008, a trademark application was filed for CEX with the United States Patent and Trademark Office. The USPTO has given the CEX trademark a serial number of 79055146. The federal status of this trademark filing is CANCELLED - SECTION 71 as of Friday, May 7, 2021. This trademark is owned by Plasmetrex GmbH. The CEX trademark is filed in the Computer & Software Products & Electrical & Scientific Products, Education & Entertainment Services, and Computer & Software Services & Scientific Services categories with the following description:

Education services, namely, providing seminars, training, and courses in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; providing of seminars, training and courses in the field of semiconductor processing and manufacturing, radio frequency technology for plasma applications, wafer damaging, e-chuck, arcing, plasma nitridation of ultra SiO2 films, and conditioning and loading effects in plasma etching; publication of texts, other than publicity texts, including internet publication of texts

Electric and electronic measuring, controlling, checking and regulating apparatus, included in this class, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recording, transmission or reproduction of sound, images and data; apparatus for the determination of process parameters in plasma processes, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition

Scientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications
cex

General Information


Serial Number79055146
Word MarkCEX
Filing DateTuesday, May 27, 2008
Status709 - CANCELLED - SECTION 71
Status DateFriday, May 7, 2021
Registration Number3867511
Registration DateTuesday, October 26, 2010
Mark Drawing3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s)
Published for Opposition DateTuesday, August 10, 2010

Trademark Statements


Goods and ServicesEducation services, namely, providing seminars, training, and courses in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; providing of seminars, training and courses in the field of semiconductor processing and manufacturing, radio frequency technology for plasma applications, wafer damaging, e-chuck, arcing, plasma nitridation of ultra SiO2 films, and conditioning and loading effects in plasma etching; publication of texts, other than publicity texts, including internet publication of texts
Description of MarkThe mark consists of stylized letters "E" and "X", which are comprised of a block format for a non-capitalized letter "e" with the left-portion of the letter "x" adjacent the block letter "c" forming an internal arrow shaped space between the two letters.
Goods and ServicesElectric and electronic measuring, controlling, checking and regulating apparatus, included in this class, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recording, transmission or reproduction of sound, images and data; apparatus for the determination of process parameters in plasma processes, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition
Pseudo MarkCEX
Indication of Colors claimedColor is not claimed as a feature of the mark.
Goods and ServicesScientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications

Classification Information


International Class009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus.
US Class Codes021, 023, 026, 036, 038
Class Status CodeF - NOT AVAILABLE
Class Status DateFriday, May 7, 2021
Primary Code009
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

International Class041 - Education; providing of training; entertainment; sporting and cultural activities.
US Class Codes100, 101, 107
Class Status CodeF - NOT AVAILABLE
Class Status DateFriday, May 7, 2021
Primary Code041
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

International Class042 - Scientific and technological services and research and design relating thereto; industrial analysis and research services; design and development of computer hardware and software.
US Class Codes100, 101
Class Status CodeF - NOT AVAILABLE
Class Status DateFriday, May 7, 2021
Primary Code042
First Use Anywhere DateNOT AVAILABLE
First Use In Commerce DateNOT AVAILABLE

Trademark Owner History


Party NamePlasmetrex GmbH
Party Type30 - Original Registrant
Legal Entity Type99 - Other
Address12489 Berlin
DE

Party NamePlasmetrex GmbH
Party Type20 - Owner at Publication
Legal Entity Type99 - Other
AddressDE

Party NamePlasmetrex GmbH
Party Type10 - Original Applicant
Legal Entity Type99 - Other
AddressDE

Trademark Events


Event DateEvent Description
Saturday, February 11, 2023NEW REPRESENTATIVE AT IB RECEIVED
Friday, February 10, 2023NEW REPRESENTATIVE AT IB RECEIVED
Monday, July 11, 2022TOTAL INVALIDATION PROCESSED BY THE IB
Friday, May 6, 2022TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB
Friday, May 6, 2022INVALIDATION PROCESSED
Friday, January 7, 2022TOTAL INVALIDATION OF REG EXT PROTECTION CREATED
Friday, May 7, 2021CANCELLED SECTION 71
Friday, February 26, 2021NEW REPRESENTATIVE AT IB RECEIVED
Friday, June 21, 2019NEW REPRESENTATIVE AT IB RECEIVED
Thursday, December 13, 2018INTERNATIONAL REGISTRATION RENEWED
Tuesday, September 27, 2016NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - MAILED
Tuesday, September 27, 2016REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK.
Tuesday, September 27, 2016CASE ASSIGNED TO POST REGISTRATION PARALEGAL
Thursday, August 25, 2016TEAS SECTION 71 & 15 RECEIVED
Friday, September 11, 2015NEW REPRESENTATIVE AT IB RECEIVED
Saturday, January 3, 2015NEW REPRESENTATIVE AT IB RECEIVED
Friday, March 22, 2013TEAS CHANGE OF CORRESPONDENCE RECEIVED
Sunday, February 17, 2013FINAL DECISION TRANSACTION PROCESSED BY IB
Wednesday, February 2, 2011FINAL DISPOSITION NOTICE SENT TO IB
Wednesday, February 2, 2011FINAL DISPOSITION PROCESSED
Wednesday, January 26, 2011FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB
Tuesday, October 26, 2010REGISTERED-PRINCIPAL REGISTER
Tuesday, August 10, 2010PUBLISHED FOR OPPOSITION
Wednesday, July 21, 2010NOTICE OF PUBLICATION
Thursday, July 8, 2010LAW OFFICE PUBLICATION REVIEW COMPLETED
Tuesday, July 6, 2010ASSIGNED TO LIE
Wednesday, June 30, 2010APPROVED FOR PUB - PRINCIPAL REGISTER
Wednesday, June 9, 2010AMENDMENT FROM APPLICANT ENTERED
Wednesday, June 9, 2010CORRESPONDENCE RECEIVED IN LAW OFFICE
Wednesday, June 9, 2010ASSIGNED TO LIE
Thursday, May 27, 2010PAPER RECEIVED
Thursday, January 14, 2010NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB
Thursday, December 24, 2009NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB
Thursday, December 24, 2009NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB
Tuesday, November 24, 2009NON-FINAL ACTION MAILED
Monday, November 23, 2009NON-FINAL ACTION WRITTEN
Tuesday, November 3, 2009ASSIGNED TO EXAMINER
Wednesday, March 18, 2009APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED
Wednesday, March 18, 2009AMENDMENT FROM APPLICANT ENTERED
Wednesday, March 18, 2009CORRESPONDENCE RECEIVED IN LAW OFFICE
Wednesday, March 18, 2009ASSIGNED TO LIE
Monday, March 16, 2009PAPER RECEIVED
Friday, November 7, 2008REFUSAL PROCESSED BY IB
Wednesday, September 17, 2008NON-FINAL ACTION MAILED - REFUSAL SENT TO IB
Wednesday, September 17, 2008REFUSAL PROCESSED BY MPU
Wednesday, September 17, 2008NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW
Tuesday, September 16, 2008NON-FINAL ACTION WRITTEN
Tuesday, September 9, 2008ASSIGNED TO EXAMINER
Friday, July 25, 2008NEW APPLICATION ENTERED
Thursday, July 24, 2008SN ASSIGNED FOR SECT 66A APPL FROM IB