Serial Number | 79055146 |
Word Mark | CEX |
Filing Date | Tuesday, May 27, 2008 |
Status | 709 - CANCELLED - SECTION 71 |
Status Date | Friday, May 7, 2021 |
Registration Number | 3867511 |
Registration Date | Tuesday, October 26, 2010 |
Mark Drawing | 3000 - Illustration: Drawing or design which also includes word(s) / letter(s) / number(s) |
Published for Opposition Date | Tuesday, August 10, 2010 |
Goods and Services | Education services, namely, providing seminars, training, and courses in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; providing of seminars, training and courses in the field of semiconductor processing and manufacturing, radio frequency technology for plasma applications, wafer damaging, e-chuck, arcing, plasma nitridation of ultra SiO2 films, and conditioning and loading effects in plasma etching; publication of texts, other than publicity texts, including internet publication of texts |
Description of Mark | The mark consists of stylized letters "E" and "X", which are comprised of a block format for a non-capitalized letter "e" with the left-portion of the letter "x" adjacent the block letter "c" forming an internal arrow shaped space between the two letters. |
Goods and Services | Electric and electronic measuring, controlling, checking and regulating apparatus, included in this class, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition; semi-conductors; apparatus for recording, transmission or reproduction of sound, images and data; apparatus for the determination of process parameters in plasma processes, namely, sensors for process development and transfer for etch and low pressure deposition, sensors for manufacturing control for etch and low pressure deposition, and sensors for manufacturing control for medium pressure deposition and plasma enhanced chemical vapor deposition |
Pseudo Mark | CEX |
Indication of Colors claimed | Color is not claimed as a feature of the mark. |
Goods and Services | Scientific and technological consultation services and research and design relating thereto in the filed of semiconductor processing and manufacturing, and radio frequency technology for plasma applications; industrial analysis and research services in the field of semiconductor processing and manufacturing, and radio frequency technology for plasma applications |
International Class | 009 - Scientific, nautical, surveying, photographic, cinematographic, optical, weighing, measuring, signalling, checking (supervision), life-saving and teaching apparatus and instruments; apparatus and instruments for conducting, switching, transforming, accumulating, regulating or controlling electricity; apparatus for recording, transmission or reproduction of sound or images; magnetic data carriers, recording discs; automatic vending machines and mechanisms for coin operated apparatus; cash registers, calculating machines, data processing equipment and computers; fire extinguishing apparatus. |
US Class Codes | 021, 023, 026, 036, 038 |
Class Status Code | F - NOT AVAILABLE |
Class Status Date | Friday, May 7, 2021 |
Primary Code | 009 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 041 - Education; providing of training; entertainment; sporting and cultural activities. |
US Class Codes | 100, 101, 107 |
Class Status Code | F - NOT AVAILABLE |
Class Status Date | Friday, May 7, 2021 |
Primary Code | 041 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
International Class | 042 - Scientific and technological services and research and design relating thereto; industrial analysis and research services; design and development of computer hardware and software. |
US Class Codes | 100, 101 |
Class Status Code | F - NOT AVAILABLE |
Class Status Date | Friday, May 7, 2021 |
Primary Code | 042 |
First Use Anywhere Date | NOT AVAILABLE |
First Use In Commerce Date | NOT AVAILABLE |
Party Name | Plasmetrex GmbH |
Party Type | 30 - Original Registrant |
Legal Entity Type | 99 - Other |
Address | 12489 Berlin DE |
Party Name | Plasmetrex GmbH |
Party Type | 20 - Owner at Publication |
Legal Entity Type | 99 - Other |
Address | DE |
Party Name | Plasmetrex GmbH |
Party Type | 10 - Original Applicant |
Legal Entity Type | 99 - Other |
Address | DE |
Event Date | Event Description |
Saturday, February 11, 2023 | NEW REPRESENTATIVE AT IB RECEIVED |
Friday, February 10, 2023 | NEW REPRESENTATIVE AT IB RECEIVED |
Monday, July 11, 2022 | TOTAL INVALIDATION PROCESSED BY THE IB |
Friday, May 6, 2022 | TOTAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
Friday, May 6, 2022 | INVALIDATION PROCESSED |
Friday, January 7, 2022 | TOTAL INVALIDATION OF REG EXT PROTECTION CREATED |
Friday, May 7, 2021 | CANCELLED SECTION 71 |
Friday, February 26, 2021 | NEW REPRESENTATIVE AT IB RECEIVED |
Friday, June 21, 2019 | NEW REPRESENTATIVE AT IB RECEIVED |
Thursday, December 13, 2018 | INTERNATIONAL REGISTRATION RENEWED |
Tuesday, September 27, 2016 | NOTICE OF ACCEPTANCE OF SEC. 71 & 15 - MAILED |
Tuesday, September 27, 2016 | REGISTERED - SEC. 71 ACCEPTED & SEC. 15 ACK. |
Tuesday, September 27, 2016 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
Thursday, August 25, 2016 | TEAS SECTION 71 & 15 RECEIVED |
Friday, September 11, 2015 | NEW REPRESENTATIVE AT IB RECEIVED |
Saturday, January 3, 2015 | NEW REPRESENTATIVE AT IB RECEIVED |
Friday, March 22, 2013 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
Sunday, February 17, 2013 | FINAL DECISION TRANSACTION PROCESSED BY IB |
Wednesday, February 2, 2011 | FINAL DISPOSITION NOTICE SENT TO IB |
Wednesday, February 2, 2011 | FINAL DISPOSITION PROCESSED |
Wednesday, January 26, 2011 | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB |
Tuesday, October 26, 2010 | REGISTERED-PRINCIPAL REGISTER |
Tuesday, August 10, 2010 | PUBLISHED FOR OPPOSITION |
Wednesday, July 21, 2010 | NOTICE OF PUBLICATION |
Thursday, July 8, 2010 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
Tuesday, July 6, 2010 | ASSIGNED TO LIE |
Wednesday, June 30, 2010 | APPROVED FOR PUB - PRINCIPAL REGISTER |
Wednesday, June 9, 2010 | AMENDMENT FROM APPLICANT ENTERED |
Wednesday, June 9, 2010 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Wednesday, June 9, 2010 | ASSIGNED TO LIE |
Thursday, May 27, 2010 | PAPER RECEIVED |
Thursday, January 14, 2010 | NOTIFICATION OF POSSIBLE OPPOSITION - PROCESSED BY IB |
Thursday, December 24, 2009 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
Thursday, December 24, 2009 | NOTIFICATION OF POSSIBLE OPPOSITION CREATED, TO BE SENT TO IB |
Tuesday, November 24, 2009 | NON-FINAL ACTION MAILED |
Monday, November 23, 2009 | NON-FINAL ACTION WRITTEN |
Tuesday, November 3, 2009 | ASSIGNED TO EXAMINER |
Wednesday, March 18, 2009 | APPLICANT/CORRESPONDENCE CHANGES (NON-RESPONSIVE) ENTERED |
Wednesday, March 18, 2009 | AMENDMENT FROM APPLICANT ENTERED |
Wednesday, March 18, 2009 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
Wednesday, March 18, 2009 | ASSIGNED TO LIE |
Monday, March 16, 2009 | PAPER RECEIVED |
Friday, November 7, 2008 | REFUSAL PROCESSED BY IB |
Wednesday, September 17, 2008 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
Wednesday, September 17, 2008 | REFUSAL PROCESSED BY MPU |
Wednesday, September 17, 2008 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
Tuesday, September 16, 2008 | NON-FINAL ACTION WRITTEN |
Tuesday, September 9, 2008 | ASSIGNED TO EXAMINER |
Friday, July 25, 2008 | NEW APPLICATION ENTERED |
Thursday, July 24, 2008 | SN ASSIGNED FOR SECT 66A APPL FROM IB |