Trademark Overview
On Wednesday, July 3, 2024, a trademark application was filed for ALTIRA with the United States Patent and Trademark Office. The USPTO has given the ALTIRA trademark a serial number of 98632652. The federal status of this trademark filing is NON-FINAL ACTION - MAILED as of Tuesday, January 28, 2025. This trademark is owned by ASM IP Holding B.V.. The ALTIRA trademark is filed in the Machinery Products and Computer & Software Products & Electrical & Scientific Products categories with the following description:
Electrical reactors for processing semiconductor wafers; reactors for processing semiconductor wafers, namely, chemical reactors for the thermal treatment of semiconductor wafers and reactors for chemical vapor deposition for depositing thin films on semiconductor wafers; laboratory chemical reactors; semiconductor wafer processing reactors for the chemical treatment and the thermal treatment of semiconductor wafers and for the chemical cleaning of semiconductor wafers by means of a gas phase process, also with the use of gas discharge; and structural and replacement parts for the aforementioned products robots being electronic control devices, namely, laboratory robots; electronic controllers for industrial robots for use by the semiconductor industry; electronic controllers for the semiconductor industry; electronic control systems for semiconductor manufacturing machines; structural parts and fittings for the aforementioned goods.
Machines and machine tools for the assembly and packaging of electronic chips and structural parts and fittings therefor; machines for manufacturing semiconductors, and structural parts and fittings therefor; semiconductor manufacturing machines; semiconductor manufacturing machines and systems composed of a vacuum chamber for accommodating semiconductor wafers and structural parts and fittings therefor; structural parts and machines for handling and transferring semiconductor wafers into and out of vacuum chambers, and structural parts and fittings therefor; machines and machine tools for the treatment of semiconductor wafers, namely, thermal treatment reactors and chemical vapor deposition reactors, chemical reactors for the thermal treatment of semiconductor wafers; machines for the plasma assisted manufacture of semiconductors, namely, vacuum treatment machines for plasma assisted deposition, and vacuum machines for depositing fine films; plasma enhanced deposition machines, namely...
![altira](https://cdn.furm.com/trademarks/98632652/b1acd54dbc1eeb8a6542d72171d3ff8e.jpg)